Mott-memories Based on the Narrow Gap Mott Insulators AM4Q8 (A=Ga, Ge ; M = V, Nb, Ta ; Q = S, Se)

2013 ◽  
Vol 1562 ◽  
Author(s):  
L. Cario ◽  
E. Janod ◽  
J. Tranchant ◽  
P. Stoliar ◽  
M. Rozenberg ◽  
...  

ABSTRACTThe narrow gap Mott insulators AM4Q8 (A = Ga, Ge; M= V, Nb, Ta; Q = S, Se) exhibit very interesting electronic properties when pressurized or chemically doped. We have recently discovered that the application of short electrical pulses on these compounds induces a new phenomenon of volatile or nonvolatile resistive switching. The volatile transition appears above threshold electric fields of a few kV/cm, while for higher electric fields, the resistive switching becomes non-volatile. The application of successive very short electric pulses enables to go back and forth between the high and low resistance states. All our results indicate that the resistive switching discovered in the GaM4Q8 compounds does not match with any previously described mechanisms. Conversely, our recent work shows that the volatile resistive switching is related to a purely electronic mechanism which suggests that the AM4Q8 compounds belong to a new class of Mott-memories for which Joule heating, thermochemical or electrochemical effects are not involved. Finally, it is possible to deposit a thin layer of GaV4S8 and to retrieve the reversible resistive switching on a metal-insulator-metal (MIM) device which proves the potential of this new class of Mott-memories for applications.

2020 ◽  
Vol 53 (29) ◽  
pp. 295302
Author(s):  
Hannes Raebiger ◽  
Antonio Claudio M Padilha ◽  
Alexandre Reily Rocha ◽  
Gustavo M Dalpian

Nanoscale ◽  
2018 ◽  
Vol 10 (37) ◽  
pp. 17983-17989 ◽  
Author(s):  
Christian Stelling ◽  
Stefan Fossati ◽  
Jakub Dostalek ◽  
Markus Retsch

Metal–insulator–metal structures prepared by self-assembly exhibit narrow gap plasmon modes, which are fully described by analytical theory.


2009 ◽  
Vol 105 (11) ◽  
pp. 114103 ◽  
Author(s):  
Ch. Walczyk ◽  
Ch. Wenger ◽  
R. Sohal ◽  
M. Lukosius ◽  
A. Fox ◽  
...  

2014 ◽  
Vol 12 (1-2) ◽  
pp. 246-249 ◽  
Author(s):  
M. Menghini ◽  
C. Quinteros ◽  
C.-Y Su ◽  
P. Homm ◽  
P. Levy ◽  
...  

2008 ◽  
Vol 92 (1) ◽  
pp. 013503 ◽  
Author(s):  
A. Chen ◽  
S. Haddad ◽  
Y. C. Wu ◽  
T. N. Fang ◽  
S. Kaza ◽  
...  

2014 ◽  
Vol 27 (4) ◽  
pp. 621-630 ◽  
Author(s):  
Albena Paskaleva ◽  
Boris Hudec ◽  
Peter Jancovic ◽  
Karol Fröhlich ◽  
Dencho Spassov

Resistive switching (RS) effects in Pt/HfO2/TiN metal-insulator-metal (MIM) capacitors have been investigated in dependence on the TiN bottom electrode engineering, deposition process, switching conditions and dielectric thickness. It is found that RS ratio depends strongly on the amount of oxygen introduced on TiN surface during interface engineering. In some structures a full recovery of conductive filament is observed within more than 100 switching cycles. RS effects are discussed in terms of different energy needed to dissociate O ions in structures with different TiN electrode treatment.


2014 ◽  
Vol 1691 ◽  
Author(s):  
H. García ◽  
H. Castán ◽  
S. Dueñas ◽  
E. Pérez ◽  
L. A. Bailón ◽  
...  

ABSTRACTHo2O3-TiO2 based metal-insulator-metal capacitors were grown by ALD, using Ho(thd)3, Ti(OCH(CH3)2)4 and ozone as precursors. The thicknesses of the films were in the range of 7.7 to 25 nm. Some of the films were post-deposited annealed in order to study the treatment effects. The capacitors were electrically characterized. Leakage current decreases as the amount of holmium increased in the films. Resistive switching behavior was obtained in the samples where the leakage current was low. This effect was also observed in Ho2O3 films, where no titanium was present in the films.


2012 ◽  
Vol 520 (14) ◽  
pp. 4551-4555 ◽  
Author(s):  
T. Bertaud ◽  
D. Walczyk ◽  
Ch. Walczyk ◽  
S. Kubotsch ◽  
M. Sowinska ◽  
...  

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