scholarly journals Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography

2018 ◽  
Vol 26 (26) ◽  
pp. 33718 ◽  
Author(s):  
M. V. Svechnikov ◽  
N. I. Chkhalo ◽  
S. A. Gusev ◽  
A. N. Nechay ◽  
D. E. Pariev ◽  
...  
Keyword(s):  
Next Generation ◽  
Multilayer Mirrors ◽  
Euv Lithography

Toward the In Situ Remediation of Carbon Deposition on Ru-Capped Multilayer Mirrors Intended for EUV Lithography:  Exploiting the Electron-Induced Chemistry

2007 ◽  
Vol 111 (33) ◽  
pp. 12165-12168 ◽  
Author(s):  
David J. Davis ◽  
Georgios Kyriakou ◽  
Robert B. Grant ◽  
Mintcho S. Tikhov ◽  
Richard M. Lambert
Keyword(s):  
Carbon Deposition ◽  
In Situ Remediation ◽  
Multilayer Mirrors ◽  
Euv Lithography

Mask absorber for next generation EUV lithography

2020 ◽  
Author(s):  
Meiyi Wu ◽  
Devesh Thakare ◽  
Jean-François de Marneffe ◽  
Patrick Jaenen ◽  
Laurent Souriau ◽  
...  
Keyword(s):  
Next Generation ◽  
Euv Lithography

Thermal stability of B-based multilayer mirrors for next generation lithography

2017 ◽  
Vol 642 ◽  
pp. 252-257
Author(s):  
P. Naujok ◽  
K. Murray ◽  
S. Yulin ◽  
C. Patzig ◽  
N. Kaiser ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Next Generation ◽  
Multilayer Mirrors ◽  
Next Generation Lithography ◽  
Thermal Stability Of

Design and development of low activation energy based nonchemically amplified resists (n-CARs) for next generation EUV lithography

2016 ◽  
Vol 164 ◽  
pp. 115-122 ◽  
Author(s):  
Satinder K. Sharma ◽  
Satyendra Prakash Pal ◽  
Pulikanti Guruprasad Reddy ◽  
Pawan Kumar ◽  
Subrata Ghosh ◽  
...  
Keyword(s):  
Activation Energy ◽  
Next Generation ◽  
Design And Development ◽  
Euv Lithography

Plasma cleaning of multilayer mirrors in EUV lithography from amorphous carbon contaminations

2011 ◽  
Vol 66 (2) ◽  
pp. 184-189 ◽  
Author(s):  
E. M. Malykhin ◽  
D. V. Lopaev ◽  
A. T. Rakhimov ◽  
T. V. Rakhimova ◽  
O. V. Braginskii ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Plasma Cleaning ◽  
Multilayer Mirrors ◽  
Euv Lithography

High performance La/B4C multilayer mirrors with barrier layers for the next generation lithography

2013 ◽  
Vol 102 (1) ◽  
pp. 011602 ◽  
Author(s):  
N. I. Chkhalo ◽  
S. Künstner ◽  
V. N. Polkovnikov ◽  
N. N. Salashchenko ◽  
F. Schäfers ◽  
...  
Keyword(s):  
High Performance ◽  
Next Generation ◽  
Multilayer Mirrors ◽  
Barrier Layers ◽  
Next Generation Lithography

scholarly journals Reduction of the Outgassing Segments and LWR Improvement for the Next Generation EUV Lithography

2007 ◽  
Vol 20 (3) ◽  
pp. 437-444 ◽  
Author(s):  
Seiya Masuda ◽  
Shinji Tarutani ◽  
Sou Kamimura ◽  
Shuuji Hirano ◽  
Wataru Hoshino ◽  
...  
Keyword(s):  
Next Generation ◽  
Euv Lithography

Single-layer and multilayer mirrors for current and next-generation light sources

2008 ◽  
Author(s):  
Michael Störmer ◽  
Christian Horstmann ◽  
Dietrich Häussler ◽  
Erdmann Spiecker ◽  
Frank Siewert ◽  
...  
Keyword(s):  
Single Layer ◽  
Light Sources ◽  
Next Generation ◽  
Multilayer Mirrors
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