Mask absorber for next generation EUV lithography

2020 ◽  
Author(s):  
Meiyi Wu ◽  
Devesh Thakare ◽  
Jean-François de Marneffe ◽  
Patrick Jaenen ◽  
Laurent Souriau ◽  
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Keyword(s):  
Next Generation ◽  
Euv Lithography

Design and development of low activation energy based nonchemically amplified resists (n-CARs) for next generation EUV lithography

2016 ◽  
Vol 164 ◽  
pp. 115-122 ◽  
Author(s):  
Satinder K. Sharma ◽  
Satyendra Prakash Pal ◽  
Pulikanti Guruprasad Reddy ◽  
Pawan Kumar ◽  
Subrata Ghosh ◽  
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Activation Energy ◽  
Next Generation ◽  
Design And Development ◽  
Euv Lithography

scholarly journals Reduction of the Outgassing Segments and LWR Improvement for the Next Generation EUV Lithography

2007 ◽  
Vol 20 (3) ◽  
pp. 437-444 ◽  
Author(s):  
Seiya Masuda ◽  
Shinji Tarutani ◽  
Sou Kamimura ◽  
Shuuji Hirano ◽  
Wataru Hoshino ◽  
...  
Keyword(s):  
Next Generation ◽  
Euv Lithography

scholarly journals Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography

2018 ◽  
Vol 26 (26) ◽  
pp. 33718 ◽  
Author(s):  
M. V. Svechnikov ◽  
N. I. Chkhalo ◽  
S. A. Gusev ◽  
A. N. Nechay ◽  
D. E. Pariev ◽  
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Keyword(s):  
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Multilayer Mirrors ◽  
Euv Lithography

SRAF requirements, relevance, and impact on EUV lithography for next-generation beyond 7nm node

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Author(s):  
Wei Guo ◽  
Fan Jiang ◽  
Yuyang Sun ◽  
Xima Zhuang ◽  
Scott Mansfield ◽  
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Euv Lithography

Electron Impact-Assisted Carbon Film Growth on Ru(0001):  Implications for Next-Generation EUV Lithography

2007 ◽  
Vol 111 (12) ◽  
pp. 4491-4494 ◽  
Author(s):  
Georgios Kyriakou ◽  
David J. Davis ◽  
Robert B. Grant ◽  
David J. Watson ◽  
Anthony Keen ◽  
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Keyword(s):  
Electron Impact ◽  
Film Growth ◽  
Carbon Film ◽  
Next Generation ◽  
Euv Lithography

High-performance next-generation EUV lithography light source

2009 ◽  
Author(s):  
Peter Choi ◽  
Sergey V. Zakharov ◽  
Raul Aliaga-Rossel ◽  
Otman Benali ◽  
Grainne Duffy ◽  
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Keyword(s):  
Light Source ◽  
High Performance ◽  
Next Generation ◽  
Euv Lithography

1477: Durability of Next Generation Flexible Ureteroscopes: Randomized Prospective Study

2004 ◽  
Vol 171 (4S) ◽  
pp. 389-389
Author(s):  
Manoj Monga ◽  
Ramakrishna Venkatesh ◽  
Sara Best ◽  
Caroline D. Ames ◽  
Courtney Lee ◽  
...  
Keyword(s):  
Prospective Study ◽  
Next Generation ◽  
Flexible Ureteroscopes
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