Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmas
2009 ◽
Vol 27
(6)
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pp. 2361
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2008 ◽
Vol 26
(4)
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pp. 857-860
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2009 ◽
Vol 48
(6)
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pp. 06FA06
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2016 ◽
Vol 8
(9)
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pp. 729-733
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2003 ◽
Vol 42
(Part 1, No. 5A)
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pp. 2639-2648
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Keyword(s):
1998 ◽
Vol 42
(12)
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pp. 2277-2281
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