Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmas

Author(s):  
H. Y. Jung ◽  
Y. R. Park ◽  
H. J. Lee ◽  
N.-E. Lee ◽  
C. Y. Jeong ◽  
...  
2009 ◽  
Vol 48 (6) ◽  
pp. 06FA06 ◽  
Author(s):  
Hyun-Duck Shin ◽  
Chang Young Jeoung ◽  
Tae Geun Kim ◽  
Sangsul Lee ◽  
In-Sung Park ◽  
...  

2013 ◽  
Vol 6 (9) ◽  
pp. 096501 ◽  
Author(s):  
Seongchul Hong ◽  
Seejun Jeong ◽  
Jae Uk Lee ◽  
Seung Min Lee ◽  
Jinho Ahn

2006 ◽  
Author(s):  
Bruno La Fontaine ◽  
Adam R. Pawloski ◽  
Obert Wood ◽  
Yunfei Deng ◽  
Harry J. Levinson ◽  
...  

2003 ◽  
Vol 42 (Part 1, No. 5A) ◽  
pp. 2639-2648 ◽  
Author(s):  
Minoru Sugawara ◽  
Akira Chiba ◽  
Iwao Nishiyama

1998 ◽  
Vol 42 (12) ◽  
pp. 2277-2281 ◽  
Author(s):  
Hyun Cho ◽  
C.B Vartuli ◽  
C.R Abernathy ◽  
S.M Donovan ◽  
S.J Pearton ◽  
...  

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