Attenuated phase-shift mask for mitigation of photon shot noise effect in contact hole pattern for extreme ultraviolet lithography

2014 ◽  
Vol 7 (9) ◽  
pp. 096502 ◽  
Author(s):  
Jung Sik Kim ◽  
Seongchul Hong ◽  
Jae Uk Lee ◽  
Seung Min Lee ◽  
Jinho Ahn
Keyword(s):  
Phase Shift ◽  
Shot Noise ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Noise Effect ◽  
Ultraviolet Lithography ◽  
Phase Shift Mask

Effect of Attenuated Phase Shift Mask Structure on Extreme Ultraviolet Lithography

2009 ◽  
Vol 48 (6) ◽  
pp. 06FA06 ◽  
Author(s):  
Hyun-Duck Shin ◽  
Chang Young Jeoung ◽  
Tae Geun Kim ◽  
Sangsul Lee ◽  
In-Sung Park ◽  
...  
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Phase Shift Mask

Stochastic Patterning Simulation Using Attenuated Phase-Shift Mask for Extreme Ultraviolet Lithography

2013 ◽  
Vol 6 (9) ◽  
pp. 096501 ◽  
Author(s):  
Seongchul Hong ◽  
Seejun Jeong ◽  
Jae Uk Lee ◽  
Seung Min Lee ◽  
Jinho Ahn
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Phase Shift Mask

Demonstration of phase-shift masks for extreme-ultraviolet lithography

2006 ◽  
Author(s):  
Bruno La Fontaine ◽  
Adam R. Pawloski ◽  
Obert Wood ◽  
Yunfei Deng ◽  
Harry J. Levinson ◽  
...  
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography

Design of Phase-Shift Masks in Extreme Ultraviolet Lithography

2003 ◽  
Vol 42 (Part 1, No. 5A) ◽  
pp. 2639-2648 ◽  
Author(s):  
Minoru Sugawara ◽  
Akira Chiba ◽  
Iwao Nishiyama
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography
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