scholarly journals Exploration of the Direct Use of Anodized Alumina as a Mold for Nanoimprint Lithography to Fabricate Magnetic Nanostructure over Large Area

2011 ◽  
Vol 2011 ◽  
pp. 1-5 ◽  
Author(s):  
M. Tofizur Rahman ◽  
Hao Wang ◽  
Jian-Ping Wang
Keyword(s):  
Surface Chemistry ◽  
Nanoimprint Lithography ◽  
Pore Diameter ◽  
Large Area ◽  
Self Assembled Monolayer ◽  
Feature Size ◽  
Magnetic Nanostructure ◽  
Self Assembled ◽  
Direct Use ◽  
Si Wafer

We have explored the direct use of anodized alumina (AAO) fabricated on an Si wafer as a mold for the nanoimprint lithography (NIL). The AAO mold has been fabricated over more than 10 cm2area with two different pore diameters of163±24 nm and73±7 nm. One of the key challenges of the lack of bonding between the antisticking self-assembled monolayer (SAM) and the AAO has been overcome by modifying the surface chemistry of the fabricated AAO mold by coating it with thin SiO2layer. Then we have applied the commonly used silane-based self-assembled monolayer (SAM) on these SiO2-coated AAO molds and achieved successful imprinting of resist pillars with feature size of172±25 nm by using the mold with a pore diameter of163±24 nm. Finally, we have achieved (001) oriented L10FePt patterned structure with a dot diameter of42±4 nm by using a AAO mold with a pore diameter of73±7 nm. The perpendicularHcof the unpatterned and patterned FePt is about 3.3 kOe and 12 kOe, respectively. These results indicate that AAO mold can potentially be used in NIL for fabricating patterned nanostructures over large area.

Patterning Organic Fluorescent Molecules with SAM Patterns

2011 ◽  
Vol 1335 ◽  
Author(s):  
Qiong Wu ◽  
Juanyuan Hao ◽  
Shoulei Shi ◽  
Weifeng Wang ◽  
Nan Lu
Keyword(s):  
Organic Molecules ◽  
Low Cost ◽  
Substrate Surface ◽  
Large Area ◽  
Self Assembled Monolayer ◽  
Storage Duration ◽  
Light Emitting ◽  
High Throughput Method ◽  
Self Assembled ◽  
Fluorescent Molecules

ABSTRACTWe report a low-cost and high-throughput method to fabricate large-area light emitting pattern via thermal evaporation of organic molecules on the patterned self-assembled monolayer of homogenous 3-aminopropyltrimethoxysilane. This method is based on the selective deposition of the organic light emitting molecules on the template of self-assembled monolayer (SAM), which is patterned with nanoimprinting lithography. The selectivity can be controlled by adjusting the design of the pattern, the storage duration and the substrate temperature. The deposition selectivity of the molecules may be caused by the different binding energy of the molecules with the SAM and the substrate surface.

Characterization of anti-adhesive self-assembled monolayer for nanoimprint lithography

2008 ◽  
Vol 255 (5) ◽  
pp. 2885-2889 ◽  
Author(s):  
Weimin Zhou ◽  
Jing Zhang ◽  
Yanbo Liu ◽  
Xiaoli Li ◽  
Xiaomin Niu ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Self Assembled Monolayer ◽  
Self Assembled

Fabrication of a Metal Roller Mold with Nanoimprinted Pattern Using Thermal Nanoimprint Lithography

2020 ◽  
Vol 12 (4) ◽  
pp. 481-485 ◽  
Author(s):  
Soongeun Kwon ◽  
Young-Jin Kim ◽  
Hyungjun Lim ◽  
Jaegu Kim ◽  
Kee-Bong Choi ◽  
...  
Keyword(s):  
Methyl Methacrylate ◽  
Nanoimprint Lithography ◽  
Laser Cutting ◽  
Pmma Film ◽  
Line Pattern ◽  
Large Area ◽  
Feature Size ◽  
Electroforming Process ◽  
Roller Body ◽  
Line Patterns

In this work, fabrication of a metal roller mold with nanoimprinted pattern was demonstrated. To get metal nanopattern on a metal roller mold, thermal nanoimprint lithography (TNIL) and subsequent electroforming process were conducted. A poly(methyl methacrylate) (PMMA) nanopattern was fabricated by TNIL process using a polydimethylsiloxane (PDMS) soft stamp on a bare PMMA film. An optimal experimental condition of TNIL process was investigated for large area, uniform PMMA nanopatterning. As a result, large area PMMA line patterns with 200 nm linewidth were fabricated by large-area TNIL process. Electroforming process on the PMMA nanopatterned film resulted in nickel (Ni) nanopattern with a linewidth of 200 nm from the PMMA line pattern. A large area (360 mm by 730 mm in width and length) Ni stamp for a roller mold was fabricated by laser cutting and tiling process of the multiple electroformed Ni stamps. We successfully fabricated a Ni roller mold with feature size of 200 nm in linewidth by attaching the large area Ni stamp to the surface of a roller body.

Characterization of Polymer Light Emitting Diodes Fabricated by Ionically Self-Assembled Monolayer Technique

1999 ◽  
Vol 598 ◽  
Author(s):  
D. Marciu ◽  
M. B. Miller ◽  
J. R. Heflin ◽  
M. A. Murray ◽  
A. L. Ritter ◽  
...  
Keyword(s):  
Film Thickness ◽  
Indium Tin Oxide ◽  
Light Emitting Diodes ◽  
Low Cost ◽  
Electrolyte Solutions ◽  
Aluminum Electrode ◽  
Large Area ◽  
Self Assembled Monolayer ◽  
Light Emitting ◽  
Self Assembled

ABSTRACTIonically self-assembled monolayer (ISAM) films are a recently developed class of materials that allows detailed structural and thickness control at the sub-nanometer level combined with ease of manufacturing and low cost. The ISAM fabrication method simply involves the dipping of a charged substrate alternately into polycationic and polyanionic aqueous solutions at room temperatures. Importantly, the ISAM technique yields exceptionally homogeneous, large area films with excellent control of total film thickness. We describe detailed studies of ISAM light emitting diodes incorporating poly(para-phenylene vinylene) (PPV) as the light emitting polymer. The individual thickness of each monolayer and the interpenetration of adjacent layers can be precisely controlled through the parameters of the electrolyte solutions. The effects of the pH and ionic strength of the immersion solutions, the total film thickness, and the PPV thermal conversion parameters on the photoluminescence and electroluminescence yields have been systematically studied. The ISAM process also allows the advantage of depositing well-defined thicknesses of separate polymers at the indium tin oxide and the aluminum electrode interfaces.

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