Fabrication of a Molecular Self-Assembled Monolayer Diode Using Nanoimprint Lithography

Nano Letters ◽  
2003 ◽  
Vol 3 (12) ◽  
pp. 1687-1690 ◽  
Author(s):  
Michael D. Austin ◽  
Stephen Y. Chou
Keyword(s):  
Nanoimprint Lithography ◽  
Self Assembled Monolayer ◽  
Self Assembled

Characterization of anti-adhesive self-assembled monolayer for nanoimprint lithography

2008 ◽  
Vol 255 (5) ◽  
pp. 2885-2889 ◽  
Author(s):  
Weimin Zhou ◽  
Jing Zhang ◽  
Yanbo Liu ◽  
Xiaoli Li ◽  
Xiaomin Niu ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Self Assembled Monolayer ◽  
Self Assembled

scholarly journals Exploration of the Direct Use of Anodized Alumina as a Mold for Nanoimprint Lithography to Fabricate Magnetic Nanostructure over Large Area

2011 ◽  
Vol 2011 ◽  
pp. 1-5 ◽  
Author(s):  
M. Tofizur Rahman ◽  
Hao Wang ◽  
Jian-Ping Wang
Keyword(s):  
Surface Chemistry ◽  
Nanoimprint Lithography ◽  
Pore Diameter ◽  
Large Area ◽  
Self Assembled Monolayer ◽  
Feature Size ◽  
Magnetic Nanostructure ◽  
Self Assembled ◽  
Direct Use ◽  
Si Wafer

We have explored the direct use of anodized alumina (AAO) fabricated on an Si wafer as a mold for the nanoimprint lithography (NIL). The AAO mold has been fabricated over more than 10 cm2area with two different pore diameters of163±24 nm and73±7 nm. One of the key challenges of the lack of bonding between the antisticking self-assembled monolayer (SAM) and the AAO has been overcome by modifying the surface chemistry of the fabricated AAO mold by coating it with thin SiO2layer. Then we have applied the commonly used silane-based self-assembled monolayer (SAM) on these SiO2-coated AAO molds and achieved successful imprinting of resist pillars with feature size of172±25 nm by using the mold with a pore diameter of163±24 nm. Finally, we have achieved (001) oriented L10FePt patterned structure with a dot diameter of42±4 nm by using a AAO mold with a pore diameter of73±7 nm. The perpendicularHcof the unpatterned and patterned FePt is about 3.3 kOe and 12 kOe, respectively. These results indicate that AAO mold can potentially be used in NIL for fabricating patterned nanostructures over large area.

Vapor-Phase Self-Assembled Monolayer for Improved Mold Release in Nanoimprint Lithography

Langmuir ◽  
2005 ◽  
Vol 21 (4) ◽  
pp. 1158-1161 ◽  
Author(s):  
Gun-Young Jung ◽  
Zhiyong Li ◽  
Wei Wu ◽  
Yong Chen ◽  
Deirdre L. Olynick ◽  
...  
Keyword(s):  
Vapor Phase ◽  
Nanoimprint Lithography ◽  
Self Assembled Monolayer ◽  
Self Assembled

Self-Assembled Fluid Phase Floating Membranes with Tuneable Water Interlayers

2019 ◽  
Author(s):  
Luke Clifton ◽  
Nicoló Paracini ◽  
Arwel V. Hughes ◽  
Jeremy H. Lakey ◽  
Nina-Juliane Seinke ◽  
...  
Keyword(s):  
Fluid Phase ◽  
Interlayer Thickness ◽  
Supported Bilayers ◽  
Self Assembled Monolayer ◽  
High Coverage ◽  
Nano Technology ◽  
Surface Distance ◽  
Potential Applications ◽  
Self Assembled ◽  
Coated Surfaces

<p>We present a reliable method for the fabrication of fluid phase unsaturated bilayers which are readily self-assembled on charged self-assembled monolayer (SAM) surfaces producing high coverage floating supported bilayers where the membrane to surface distance could be controlled with nanometer precision. Vesicle fusion was used to deposit the bilayers onto anionic SAM coated surfaces. Upon assembly the bilayer to SAM solution interlayer thickness was 7-10 Å with evidence suggesting that this layer was present due to SAM hydration repulsion of the bilayer from the surface. This distance could be increased using low concentrations of salts which caused the interlayer thickness to enlarge to ~33 Å. Reducing the salt concentration resulted in a return to a shorter bilayer to surface distance. These accessible and controllable membrane models are well suited to a range of potential applications in biophysical studies, bio-sensors and Nano-technology.</p><br>

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