Validating the Mott Formula with Self-Assembled Monolayer (SAM)-Based Large-Area Junctions: Effect of Length, Backbone, Spacer, Substituent, and Electrode on the Thermopower of SAMs

2021 ◽  
Vol 125 (36) ◽  
pp. 20035-20047
Author(s):  
Sohyun Park ◽  
Jiung Jang ◽  
Hyo Jae Yoon
Keyword(s):  
Large Area ◽  
Self Assembled Monolayer ◽  
Self Assembled ◽  
Mott Formula

Patterning Organic Fluorescent Molecules with SAM Patterns

2011 ◽  
Vol 1335 ◽  
Author(s):  
Qiong Wu ◽  
Juanyuan Hao ◽  
Shoulei Shi ◽  
Weifeng Wang ◽  
Nan Lu
Keyword(s):  
Organic Molecules ◽  
Low Cost ◽  
Substrate Surface ◽  
Large Area ◽  
Self Assembled Monolayer ◽  
Storage Duration ◽  
Light Emitting ◽  
High Throughput Method ◽  
Self Assembled ◽  
Fluorescent Molecules

ABSTRACTWe report a low-cost and high-throughput method to fabricate large-area light emitting pattern via thermal evaporation of organic molecules on the patterned self-assembled monolayer of homogenous 3-aminopropyltrimethoxysilane. This method is based on the selective deposition of the organic light emitting molecules on the template of self-assembled monolayer (SAM), which is patterned with nanoimprinting lithography. The selectivity can be controlled by adjusting the design of the pattern, the storage duration and the substrate temperature. The deposition selectivity of the molecules may be caused by the different binding energy of the molecules with the SAM and the substrate surface.

Characterization of Polymer Light Emitting Diodes Fabricated by Ionically Self-Assembled Monolayer Technique

1999 ◽  
Vol 598 ◽  
Author(s):  
D. Marciu ◽  
M. B. Miller ◽  
J. R. Heflin ◽  
M. A. Murray ◽  
A. L. Ritter ◽  
...  
Keyword(s):  
Film Thickness ◽  
Indium Tin Oxide ◽  
Light Emitting Diodes ◽  
Low Cost ◽  
Electrolyte Solutions ◽  
Aluminum Electrode ◽  
Large Area ◽  
Self Assembled Monolayer ◽  
Light Emitting ◽  
Self Assembled

ABSTRACTIonically self-assembled monolayer (ISAM) films are a recently developed class of materials that allows detailed structural and thickness control at the sub-nanometer level combined with ease of manufacturing and low cost. The ISAM fabrication method simply involves the dipping of a charged substrate alternately into polycationic and polyanionic aqueous solutions at room temperatures. Importantly, the ISAM technique yields exceptionally homogeneous, large area films with excellent control of total film thickness. We describe detailed studies of ISAM light emitting diodes incorporating poly(para-phenylene vinylene) (PPV) as the light emitting polymer. The individual thickness of each monolayer and the interpenetration of adjacent layers can be precisely controlled through the parameters of the electrolyte solutions. The effects of the pH and ionic strength of the immersion solutions, the total film thickness, and the PPV thermal conversion parameters on the photoluminescence and electroluminescence yields have been systematically studied. The ISAM process also allows the advantage of depositing well-defined thicknesses of separate polymers at the indium tin oxide and the aluminum electrode interfaces.

scholarly journals Exploration of the Direct Use of Anodized Alumina as a Mold for Nanoimprint Lithography to Fabricate Magnetic Nanostructure over Large Area

2011 ◽  
Vol 2011 ◽  
pp. 1-5 ◽  
Author(s):  
M. Tofizur Rahman ◽  
Hao Wang ◽  
Jian-Ping Wang
Keyword(s):  
Surface Chemistry ◽  
Nanoimprint Lithography ◽  
Pore Diameter ◽  
Large Area ◽  
Self Assembled Monolayer ◽  
Feature Size ◽  
Magnetic Nanostructure ◽  
Self Assembled ◽  
Direct Use ◽  
Si Wafer

We have explored the direct use of anodized alumina (AAO) fabricated on an Si wafer as a mold for the nanoimprint lithography (NIL). The AAO mold has been fabricated over more than 10 cm2area with two different pore diameters of163±24 nm and73±7 nm. One of the key challenges of the lack of bonding between the antisticking self-assembled monolayer (SAM) and the AAO has been overcome by modifying the surface chemistry of the fabricated AAO mold by coating it with thin SiO2layer. Then we have applied the commonly used silane-based self-assembled monolayer (SAM) on these SiO2-coated AAO molds and achieved successful imprinting of resist pillars with feature size of172±25 nm by using the mold with a pore diameter of163±24 nm. Finally, we have achieved (001) oriented L10FePt patterned structure with a dot diameter of42±4 nm by using a AAO mold with a pore diameter of73±7 nm. The perpendicularHcof the unpatterned and patterned FePt is about 3.3 kOe and 12 kOe, respectively. These results indicate that AAO mold can potentially be used in NIL for fabricating patterned nanostructures over large area.

Large-Area Self-Assembled Monolayer of Silica Microspheres by Convective Assembly

2014 ◽  
Vol 609-610 ◽  
pp. 479-482
Author(s):  
Yue Hui Wang
Keyword(s):  
Hydrodynamic Drag ◽  
Large Area ◽  
Silica Microspheres ◽  
Self Assembled Monolayer ◽  
Etching Technique ◽  
Convective Assembly ◽  
Glass Substrates ◽  
Wide Range ◽  
Assembled Monolayers ◽  
Self Assembled

We reported here a convective assembly process for the formation of large-area self-assembled monolayers of silica microspheres on silicon and glass substrates. Uniformly coated monolayers of silica spheres were achieved on silicon wafers with and without coated SiN2 of 3 inch of diameter and large glass substrate of 6 × 6 in2 in size. The coating of large-area uniform monolayers of silica microspheres was characterized with scanning electron microscopy and optical microscopy. The mechanism of the convective assembly has been explained by the convective flux that is generated by capillary immersion force caused from the solution evaporation and hydrodynamic drag force. The patterns of silica microspheres were transferred to the silicon substrates using a deep reactive ion etching technique. It is found that textured silicon reduced the reflectance of silicon substrate from 52.2% to 33.2% around 400 nm and from 33.9% to 19.5% around 1,100 nm. The rapid self-assembled monolayer with silica microspheres provided a glimpse at the wide range of coating and photonic device applications where convective assembly can be used.

scholarly journals One-Volt, Solution-Processed Organic Transistors with Self-Assembled Monolayer-Ta2O5 Gate Dielectrics

Materials ◽  
2019 ◽  
Vol 12 (16) ◽  
pp. 2563 ◽  
Author(s):  
Navid Mohammadian ◽  
Sheida Faraji ◽  
Srikrishna Sagar ◽  
Bikas C. Das ◽  
Michael L. Turner ◽  
...  
Keyword(s):  
Low Voltage ◽  
Gate Dielectrics ◽  
Low Cost ◽  
Tantalum Pentoxide ◽  
Organic Thin Film ◽  
Large Area ◽  
Self Assembled Monolayer ◽  
Solution Processed ◽  
Saturation Field ◽  
Self Assembled

Low-voltage, solution-processed organic thin-film transistors (OTFTs) have tremendous potential to be key components in low-cost, flexible and large-area electronics. However, for these devices to operate at low voltage, robust and high capacitance gate dielectrics are urgently needed. Herein, the fabrication of OTFTs that operate at 1 V is reported. These devices comprise a solution-processed, self-assembled monolayer (SAM) modified tantalum pentoxide (Ta2O5) as the gate dielectric. The morphology and dielectric properties of the anodized Ta2O5 films with and without n-octadecyltrichlorosilane (OTS) SAM treatment have been studied. The thickness of the Ta2O5 film was optimized by varying the anodization voltage. The results show that organic TFTs gated with OTS-modified tantalum pentoxide anodized at 3 V (d ~7 nm) exhibit the best performance. The devices operate at 1 V with a saturation field-effect mobility larger than 0.2 cm2 V−1 s−1, threshold voltage −0.55 V, subthreshold swing 120 mV/dec, and current on/off ratio in excess of 5 × 103. As a result, the demonstrated OTFTs display a promising performance for applications in low-voltage, portable electronics.

scholarly journals Self assembled monolayer of silica nanoparticles with improved order by drop casting

RSC Advances ◽  
2020 ◽  
Vol 10 (31) ◽  
pp. 18339-18347
Author(s):  
Asma Qdemat ◽  
Emmanuel Kentzinger ◽  
Johan Buitenhuis ◽  
Ulrich Rücker ◽  
Marina Ganeva ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Silica Nanoparticles ◽  
Small Angle ◽  
Grazing Incidence ◽  
Small Angle Scattering ◽  
Large Area ◽  
Self Assembled Monolayer ◽  
Angle Scattering ◽  
Self Assembled

Grazing incidence small angle scattering and electron microscopy have been used to show a large area monolayers with improved order.

Fabrication and Application of Nanostructures Using Gas-Assisted Hot Embossing and Self-Assembled Nanospheres

2015 ◽  
Vol 659 ◽  
pp. 399-403 ◽  
Author(s):  
Rong Hong Hong ◽  
Cheng Cih ◽  
To Chung Shu ◽  
Sen Yeu Yang
Keyword(s):  
Near Infrared ◽  
Low Cost ◽  
Hot Embossing ◽  
Large Area ◽  
Self Assembled Monolayer ◽  
Glass Substrates ◽  
Plasma Sputtering ◽  
Nanostructure Arrays ◽  
Self Assembled ◽  
Better Than

We develop a simple and competitive fabrication of antireflective (AR) films with high-ordered nanostructure arrays on polycarbonate (PC) substrate by using gas-assisted hot embossing and a self-assembled technique. In this method, a self-assembled monolayer of polystyrene (PS) nanospheres is well-patterned on glass substrates as the first template. Subsequently, we use the plasma sputtering to deposit a conductive layer onto the surface of nanosphere (NS) patterned substrates, and then, electroforming is applied to fabricate a nickel mold with an inverse shape of nanospheres. In the last step, a unique glass transition is utilized to duplicate nanostructures on PC films via gas-assisted hot embossing. Not only in visible light but in near infrared, the optical properties of this AR film are similar or better than for other methods. This fabrication process also has great potential in industry, with its simplicity, large-area but low-cost.

Sign in / Sign up

Export Citation Format

Share Document