Fabrication of a Metal Roller Mold with Nanoimprinted Pattern Using Thermal Nanoimprint Lithography

2020 ◽  
Vol 12 (4) ◽  
pp. 481-485 ◽  
Author(s):  
Soongeun Kwon ◽  
Young-Jin Kim ◽  
Hyungjun Lim ◽  
Jaegu Kim ◽  
Kee-Bong Choi ◽  
...  
Keyword(s):  
Methyl Methacrylate ◽  
Nanoimprint Lithography ◽  
Laser Cutting ◽  
Pmma Film ◽  
Line Pattern ◽  
Large Area ◽  
Feature Size ◽  
Electroforming Process ◽  
Roller Body ◽  
Line Patterns

In this work, fabrication of a metal roller mold with nanoimprinted pattern was demonstrated. To get metal nanopattern on a metal roller mold, thermal nanoimprint lithography (TNIL) and subsequent electroforming process were conducted. A poly(methyl methacrylate) (PMMA) nanopattern was fabricated by TNIL process using a polydimethylsiloxane (PDMS) soft stamp on a bare PMMA film. An optimal experimental condition of TNIL process was investigated for large area, uniform PMMA nanopatterning. As a result, large area PMMA line patterns with 200 nm linewidth were fabricated by large-area TNIL process. Electroforming process on the PMMA nanopatterned film resulted in nickel (Ni) nanopattern with a linewidth of 200 nm from the PMMA line pattern. A large area (360 mm by 730 mm in width and length) Ni stamp for a roller mold was fabricated by laser cutting and tiling process of the multiple electroformed Ni stamps. We successfully fabricated a Ni roller mold with feature size of 200 nm in linewidth by attaching the large area Ni stamp to the surface of a roller body.

scholarly journals Exploration of the Direct Use of Anodized Alumina as a Mold for Nanoimprint Lithography to Fabricate Magnetic Nanostructure over Large Area

2011 ◽  
Vol 2011 ◽  
pp. 1-5 ◽  
Author(s):  
M. Tofizur Rahman ◽  
Hao Wang ◽  
Jian-Ping Wang
Keyword(s):  
Surface Chemistry ◽  
Nanoimprint Lithography ◽  
Pore Diameter ◽  
Large Area ◽  
Self Assembled Monolayer ◽  
Feature Size ◽  
Magnetic Nanostructure ◽  
Self Assembled ◽  
Direct Use ◽  
Si Wafer

We have explored the direct use of anodized alumina (AAO) fabricated on an Si wafer as a mold for the nanoimprint lithography (NIL). The AAO mold has been fabricated over more than 10 cm2area with two different pore diameters of163±24 nm and73±7 nm. One of the key challenges of the lack of bonding between the antisticking self-assembled monolayer (SAM) and the AAO has been overcome by modifying the surface chemistry of the fabricated AAO mold by coating it with thin SiO2layer. Then we have applied the commonly used silane-based self-assembled monolayer (SAM) on these SiO2-coated AAO molds and achieved successful imprinting of resist pillars with feature size of172±25 nm by using the mold with a pore diameter of163±24 nm. Finally, we have achieved (001) oriented L10FePt patterned structure with a dot diameter of42±4 nm by using a AAO mold with a pore diameter of73±7 nm. The perpendicularHcof the unpatterned and patterned FePt is about 3.3 kOe and 12 kOe, respectively. These results indicate that AAO mold can potentially be used in NIL for fabricating patterned nanostructures over large area.

scholarly journals Transfer Durability of Line-Patterned Replica Mold Made of High-Hardness UV-Curable Resin

Nanomaterials ◽  
2020 ◽  
Vol 10 (10) ◽  
pp. 1956
Author(s):  
Tetsuma Marumo ◽  
Shin Hiwasa ◽  
Jun Taniguchi
Keyword(s):  
Contact Angle ◽  
Nanoimprint Lithography ◽  
High Hardness ◽  
Contact Angle Measurement ◽  
Angle Measurement ◽  
Line Pattern ◽  
Uv Curable ◽  
High Durability ◽  
Uv Curable Resin ◽  
Line Patterns

Ultraviolet nanoimprint lithography (UV-NIL) requires high durability of the mold for the mass production of nanostructures. To evaluate the durability of a line-patterned replica mold made of high-hardness UV curable resin, repetitive transfer and contact angle measurements of the replica mold were carried out. In the line patterns, as the contact angle decreases due to repeated transfer, capillary action occurs, and water flows along them. Therefore, it can be said that a mold with a line pattern exhibits an anisotropic contact angle because these values vary depending on the direction of the contact angle measurement. Subsequently, these anisotropic characteristics were investigated. It was determined that it was possible to predict the lifetime of line-and-space molds over repeated transfers. As the transcription was repeated, the contact angle along the line patterns decreased significantly before becoming constant. Moreover, the contact angle across the line pattern decreased slowly while maintaining a high contact angle with respect to the contact angle along the line pattern. The contact angle then decreased linearly from approximately 90°. The mold was found to be macroscopically defect when the values of the contact angle along the line pattern and the contact angle across the line pattern were close. Predicting the mold’s lifetime could potentially lead to a shortened durability evaluation time and the avoidance of pattern defects.

scholarly journals Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Nanomaterials ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 956
Author(s):  
Philipp Taus ◽  
Adrian Prinz ◽  
Heinz D. Wanzenboeck ◽  
Patrick Schuller ◽  
Anton Tsenov ◽  
...  
Keyword(s):  
Electron Beam Lithography ◽  
Nanoimprint Lithography ◽  
Silicon Oxide ◽  
Three Dimensional ◽  
Single Layer ◽  
Fabrication Technology ◽  
Large Area ◽  
Structural Colors ◽  
Biomimetic Structures ◽  
Morpho Butterfly

Biomimetic structures such as structural colors demand a fabrication technology of complex three-dimensional nanostructures on large areas. Nanoimprint lithography (NIL) is capable of large area replication of three-dimensional structures, but the master stamp fabrication is often a bottleneck. We have demonstrated different approaches allowing for the generation of sophisticated undercut T-shaped masters for NIL replication. With a layer-stack of phase transition material (PTM) on poly-Si, we have demonstrated the successful fabrication of a single layer undercut T-shaped structure. With a multilayer-stack of silicon oxide on silicon, we have shown the successful fabrication of a multilayer undercut T-shaped structures. For patterning optical lithography, electron beam lithography and nanoimprint lithography have been compared and have yielded structures from 10 µm down to 300 nm. The multilayer undercut T-shaped structures closely resemble the geometry of the surface of a Morpho butterfly, and may be used in future to replicate structural colors on artificial surfaces.

scholarly journals Towards achieving a large-area and defect-free nano-line pattern via controlled self-assembly by sequential annealing

Giant ◽  
2021 ◽  
pp. 100078
Author(s):  
Tao Wen ◽  
Bo Ni ◽  
Yuchu Liu ◽  
Wei Zhang ◽  
Zi-Hao Guo ◽  
...  
Keyword(s):  
Self Assembly ◽  
Line Pattern ◽  
Large Area

scholarly journals Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Process

2021 ◽  
Vol 11 (20) ◽  
pp. 9571
Author(s):  
Ga Eul Kim ◽  
Hyuntae Kim ◽  
Kyoohee Woo ◽  
Yousung Kang ◽  
Seung-Hyun Lee ◽  
...  
Keyword(s):  
Contact Pressure ◽  
Nanoimprint Lithography ◽  
Applied Pressure ◽  
Machine Learning Techniques ◽  
Conventional System ◽  
Large Area ◽  
High Productivity ◽  
Roll To Roll ◽  
Learning Techniques ◽  
Roller Machine

We aimed to increase the processing area of the roll-to-roll (R2R) nanoimprint lithography (NIL) process for high productivity, using a long roller. It is common for a long roller to have bending deformation, geometric errors and misalignment. This causes the non-uniformity of contact pressure between the rollers, which leads to defects such as non-uniform patterning. The non-uniformity of the contact pressure of the conventional R2R NIL system was investigated through finite element (FE) analysis and experiments in the conventional system. To solve the problem, a new large-area R2R NIL uniform pressing system with five multi-backup rollers was proposed and manufactured instead of the conventional system. As a preliminary experiment, the possibility of uniform contact pressure was confirmed by using only the pressure at both ends and one backup roller in the center. A more even contact pressure was achieved by using all five backup rollers and applying an appropriate pushing force to each backup roller. Machine learning techniques were applied to find the optimal combination of the pushing forces. In the conventional pressing process, it was confirmed that pressure deviation of the contact area occurred at a level of 44%; when the improved system was applied, pressure deviation dropped to 5%.

A Study on Large Area Laser Cutting of High Strength Laminated Fiber Composites

Applied laser ◽  
2012 ◽  
Vol 32 (3) ◽  
pp. 188-192
Author(s):  
沈一愚 Shen Yiyu ◽  
姜兆华 Jiang Zhaohua ◽  
陈俊 Chen Jun ◽  
潘涌 Pang Yong ◽  
骆公序 Luo Gongxu ◽  
...  
Keyword(s):  
Laser Cutting ◽  
High Strength ◽  
Fiber Composites ◽  
Large Area
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