Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al[sub 2]O[sub 3] and ZnO for Transparent Thin Film Transistor Applications

Sung-Min Yoon; Sang-Hee Ko Park; Chun-Won Byun; Shin-Hyuk Yang; Chi-Sun Hwang

doi:10.1149/1.3421680

Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al[sub 2]O[sub 3] and ZnO for Transparent Thin Film Transistor Applications

Journal of The Electrochemical Society ◽

10.1149/1.3421680 ◽

2010 ◽

Vol 157 (7) ◽

pp. H727 ◽

Cited By ~ 7

Author(s):

Sung-Min Yoon ◽

Sang-Hee Ko Park ◽

Chun-Won Byun ◽

Shin-Hyuk Yang ◽

Chi-Sun Hwang

Keyword(s):

Thin Film ◽

Thin Film Transistor ◽

Electrical Characterization ◽

Atomic Layer ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Transparent Thin Film Transistor

Download Full-text

Interface trap characterization of atomic layer deposition Al2O3/GaN metal-insulator-semiconductor capacitors using optically and thermally based deep level spectroscopies

Journal of Applied Physics ◽

10.1063/1.4808093 ◽

2013 ◽

Vol 113 (20) ◽

pp. 204505 ◽

Cited By ~ 32

Author(s):

Christine M. Jackson ◽

Aaron R. Arehart ◽

Emre Cinkilic ◽

Brian McSkimming ◽

James S. Speck ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Deep Level ◽

Atomic Layer ◽

Interface Trap ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Layer Deposition

Download Full-text

Realization in Clean Room and Electrical Characterization of P-Type Thin Film Transistor

Microelectronics Education ◽

10.1007/978-94-011-5110-8_24 ◽

1998 ◽

pp. 99-102

Author(s):

O. Bonnaud ◽

D. Guillet ◽

F. Raoult ◽

A. C. Salaun

Keyword(s):

Thin Film ◽

Thin Film Transistor ◽

Electrical Characterization ◽

Clean Room ◽

P Type

Download Full-text

Influence of Gate Dielectrics on Electrical Characterization of ZnO Schottky Thin Film Transistor

Procedia Computer Science ◽

10.1016/j.procs.2020.04.132 ◽

2020 ◽

Vol 171 ◽

pp. 1231-1240

Author(s):

Sukanya Ghosh ◽

Lintu Rajan

Keyword(s):

Thin Film ◽

Gate Dielectrics ◽

Thin Film Transistor ◽

Electrical Characterization

Download Full-text

Characterization of metal–ferroelectric–metal–insulator–semiconductor structures using ferroelectric Al-doped HfO2 thin films prepared by atomic-layer deposition with different O3 doses

Japanese Journal of Applied Physics ◽

10.7567/1347-4065/ab2c62 ◽

2019 ◽

Vol 58 (7) ◽

pp. 070907 ◽

Cited By ~ 3

Author(s):

So-Yeong Na ◽

So-Jung Yoon ◽

Seung-Youl Kang ◽

Seung-Eon Moon ◽

Sung-Min Yoon

Keyword(s):

Thin Films ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Structures ◽

Layer Deposition

Download Full-text

Electrical characterization of reduced graphene oxide (rGO) on organic thin film transistor (OTFT)

10.1063/1.4975268 ◽

2017 ◽

Author(s):

Nurhazwani Musa ◽

Nurul Farhanah Ab. Halim ◽

Mohd Noor Ahmad ◽

Zulkhairi Zakaria ◽

Uda Hashim

Keyword(s):

Thin Film ◽

Graphene Oxide ◽

Reduced Graphene Oxide ◽

Thin Film Transistor ◽

Electrical Characterization ◽

Organic Thin Film ◽

Organic Thin Film Transistor ◽

Reduced Graphene

Download Full-text

Electrical characterization of metal–insulator–semiconductor capacitors with xerogel as dielectric

Applied Physics Letters ◽

10.1063/1.1458065 ◽

2002 ◽

Vol 80 (10) ◽

pp. 1800-1802 ◽

Cited By ~ 6

Author(s):

E. Anulekha Manjari ◽

A. Subrahmanyam ◽

N. DasGupta ◽

A. DasGupta

Keyword(s):

Electrical Characterization ◽

Metal Insulator ◽

Metal Insulator Semiconductor

Download Full-text

Electrical Characterization of Metal–Insulator–Metal Capacitors with Atomic-Layer-Deposited HfO 2 Dielectrics for Radio Frequency Integrated Circuit Application

Chinese Physics Letters ◽

10.1088/0256-307x/24/10/063 ◽

2007 ◽

Vol 24 (10) ◽

pp. 2942-2944 ◽

Cited By ~ 10

Author(s):

Huang Yu-Jian ◽

Huang Yue ◽

Ding Shi-Jin ◽

Zhang Wei ◽

Liu Ran

Keyword(s):

Radio Frequency ◽

Integrated Circuit ◽

Electrical Characterization ◽

Atomic Layer ◽

Metal Insulator ◽

Metal Insulator Metal

Download Full-text

Electrical characterization of high-k based metal-insulator-semiconductor structures with negative resistance effect when using Al2O3 and nanolaminated films deposited on p-Si

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3521383 ◽

2011 ◽

Vol 29 (1) ◽

pp. 01A901 ◽

Cited By ~ 10

Author(s):

A. Gómez ◽

H. Castán ◽

H. García ◽

S. Dueñas ◽

L. Bailón ◽

...

Keyword(s):

Electrical Characterization ◽

Negative Resistance ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Structures ◽

High K

Download Full-text

Electrical characterization of Au/n-GaN metal–semiconductor and Au/SiO2/n-GaN metal–insulator–semiconductor structures

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2011.05.055 ◽

2011 ◽

Vol 509 (31) ◽

pp. 8001-8007 ◽

Cited By ~ 63

Author(s):

V. Rajagopal Reddy ◽

M. Siva Pratap Reddy ◽

B. Prasanna Lakshmi ◽

A. Ashok Kumar

Keyword(s):

Electrical Characterization ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Structures

Download Full-text

Electrical characterization of PMMA:TiO2 gate dielectric for metal-insulator-semiconductor devices

2013 IEEE Student Conference on Research and Developement ◽

10.1109/scored.2013.7002620 ◽

2013 ◽

Cited By ~ 1

Author(s):

L. N. Ismail ◽

M. N. A. Sauqi ◽

Z. Habibah ◽

S. H. Herman ◽

M. N. Asiah ◽

...

Keyword(s):

Gate Dielectric ◽

Semiconductor Devices ◽

Electrical Characterization ◽

Metal Insulator ◽

Metal Insulator Semiconductor

Download Full-text