Role of gas feed delivery and dilutent on oxide etching in an inductively coupled plasma etch system
1998 ◽
Vol 16
(3)
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pp. 1459-1463
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2005 ◽
Vol 44
(10)
◽
pp. 7234-7237
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Keyword(s):
1988 ◽
Vol 43
(4-5)
◽
pp. 325-337
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2005 ◽
Vol 23
(2)
◽
pp. 248-255
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1985 ◽
Vol 40
(10-12)
◽
pp. 1401-1410
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2003 ◽
Vol 18
(1)
◽
pp. 45-52
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