Annealing of Fowler-Nordheim Stress-Induced Leakage Currents in Thin Silicon Dioxide Films

2000 ◽  
Vol 147 (12) ◽  
pp. 4676
Author(s):  
C. H. Ang ◽  
C. H. Ling ◽  
Z. Y. Cheng ◽  
S. J. Kim ◽  
B. J. Cho
1989 ◽  
Author(s):  
A. Kalnitsky ◽  
S. P. Tay ◽  
J. P. Ellul ◽  
J. W. Andrews ◽  
E. A. Irene ◽  
...  

1971 ◽  
Vol 118 (4) ◽  
pp. 614 ◽  
Author(s):  
K. H. Beckmann ◽  
N. J. Harrick

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