Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists

2001 ◽  
Vol 45 (5) ◽  
pp. 667-682 ◽  
Author(s):  
W. D. Hinsberg ◽  
F. A. Houle ◽  
M. I. Sanchez ◽  
G. M. Wallraff
Keyword(s):  
Post Exposure ◽  
Chemically Amplified ◽  
Baking Process ◽  
Chemically Amplified Resists

Sub-millisecond post exposure bake of chemically amplified resists by CO 2 laser heat treatment

2010 ◽  
Author(s):  
Byungki Jung ◽  
Jing Sha ◽  
Florencia Paredes ◽  
Christopher K. Ober ◽  
Michael O. Thompson ◽  
...  
Keyword(s):  
Heat Treatment ◽  
Laser Heat Treatment ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Laser Heat ◽  
Post Exposure Bake ◽  
Chemically Amplified Resists

Effect of post-exposure delay in positive acting chemically amplified resists: An analytical study

1992 ◽  
Vol 32 (21) ◽  
pp. 1565-1570 ◽  
Author(s):  
O. Nalamasu ◽  
E. Reichmanis ◽  
J. E. Hanson ◽  
R. S. Kanga ◽  
L. A. Heimbrook ◽  
...  
Keyword(s):  
Analytical Study ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Process techniques for improving post-exposure delay stability in chemically amplified resists

1997 ◽  
Author(s):  
Sassan Nour ◽  
Edward K. Pavelchek ◽  
Tracy K. Lindsay ◽  
Matthew L. Moynihan ◽  
Lori Gambin
Keyword(s):  
Post Exposure ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Addressing challenges in lithography using sub-millisecond post exposure bake of chemically amplified resists

2011 ◽  
Author(s):  
Byungki Jung ◽  
Christopher K. Ober ◽  
Michael O. Thompson ◽  
Todd R. Younkin ◽  
Manish Chandhok
Keyword(s):  
Post Exposure ◽  
Chemically Amplified ◽  
Post Exposure Bake ◽  
Chemically Amplified Resists
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