Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS
1997 ◽
Vol 41
(1.2)
◽
pp. 119-129
◽
2011 ◽
Vol 131
(2)
◽
pp. 320-328
◽
2002 ◽
Vol 1
(2)
◽
pp. 136
◽
Keyword(s):
2004 ◽
Vol 41
(3)
◽
pp. 477-487
◽