Stress-Polarity-Independent Negative Threshold Voltage Shift in HfO2/TiN P-Channel Metal Oxide Semiconductor Field-Effect Transistor

2008 ◽  
Vol 47 (1) ◽  
pp. 136-138
Author(s):  
Hokyung Park ◽  
Rino Choi ◽  
Byoung Hun Lee ◽  
Gennadi Bersuker ◽  
Hyunsang Hwang
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