Threshold voltage study of scaled self‐aligned In
0.53
Ga
0.47
As metal oxide semiconductor field effect transistor for different source/drain doping concentrations
2002 ◽
Vol 20
(4)
◽
pp. 1706
◽
2002 ◽
Vol 41
(Part 1, No. 7A)
◽
pp. 4484-4488
◽
2015 ◽
Vol 29
(2)
◽
pp. 230-242
◽
2006 ◽
Vol 45
(4B)
◽
pp. 3074-3078
◽