Sharp-line, donor–acceptor pair recombination luminescence in Si(In,Li), Si(Ga,Li), Si(Al,Li), and Si(B,Li)

1982 ◽  
Vol 60 (7) ◽  
pp. 1041-1052 ◽  
Author(s):  
U. O. Ziemelis ◽  
M. L. W. Thewalt ◽  
R. R. Parsons

The observation of sharp-line, donor–acceptor pair recombination luminescence in Si following the diffusion of the donor Li into samples previously doped with the acceptors B, Al, Ga, or In is reported. Shell assignments have been made for most of the numerous new photoluminescence lines. These assignments indicate that the principal donor introduced into the samples was the Li–O complex, and that the principal acceptor in the In-doped samples was the In–X centre. Results for the Al- and Ga-doped samples are consistent with ordinary Al and Ga acceptors, while those for B are inconclusive due to the extreme weakness of the sharp-line structure. This study not only confirms that donor–acceptor pair recombination in Si can give rise to sharp luminescence line series, but shows that this process is quite widespread, given the proper concentrations of donors and acceptors.

1981 ◽  
Vol 59 (6) ◽  
pp. 784-801 ◽  
Author(s):  
U. O. Ziemelis ◽  
R. R. Parsons

New sharp line structure observed in the near-band-edge (1030 to 1135 meV) photoluminescence of Si(P, In) and Si(B, In) at temperatures ranging from 1.6 to 20 K, has been identified as due to radiative recombination of electrons bound to phosphorus donors with holes bound to indium acceptors. This is the first study of sharp line, donor–acceptor pair luminescence in silicon. Straightforward analysis, assuming only Coulomb and van der Waals interactions between otherwise isolated donor and acceptor centres indicates that recombination involving P and In centres separated by distances ranging from 7.7 to 20 Å is responsible for the observed sharp line structure. This structure is superimposed on the high energy shoulder of the broad band luminescence associated with recombination involving distant (average separation: 55 Å) P–In pairs. Transient measurements indicate decay times ranging from 70 to 100 μs for the most prominent sharp lines and an overall decay pattern consistent with that expected for donor–acceptor pair recombination.


1968 ◽  
Vol 168 (3) ◽  
pp. 902-904 ◽  
Author(s):  
M. R. Lorenz ◽  
T. N. Morgan ◽  
G. D. Pettit ◽  
W. J. Turner

2006 ◽  
Vol 203 (11) ◽  
pp. 2891-2896 ◽  
Author(s):  
K. Tanaka ◽  
Y. Miyamoto ◽  
H. Uchiki ◽  
K. Nakazawa ◽  
H. Araki

2015 ◽  
Vol 107 (3) ◽  
pp. 032101 ◽  
Author(s):  
Naoya Aihara ◽  
Kunihiko Tanaka ◽  
Hisao Uchiki ◽  
Ayaka Kanai ◽  
Hideaki Araki

1994 ◽  
Vol 138 (1-4) ◽  
pp. 815-819 ◽  
Author(s):  
Ch. Friske ◽  
R. Heitz ◽  
B. Lummer ◽  
V. Kutzer ◽  
A. Hoffmann ◽  
...  

1989 ◽  
Vol 162 ◽  
Author(s):  
J. A. Freitas ◽  
S. G. Bishop

ABSTRACTThe temperature and excitation intensity dependence of photoluminescence (PL) spectra have been studied in thin films of SiC grown by chemical vapor deposition on Si (100) substrates. The low power PL spectra from all samples exhibited a donor-acceptor pair PL band which involves a previously undetected deep acceptor whose binding energy is approximately 470 meV. This deep acceptor is found in every sample studied independent of growth reactor, suggesting the possibility that this background acceptor is at least partially responsible for the high compensation observed in Hall effect studies of undoped films of cubic SiC.


Author(s):  
R. Freitag ◽  
K. Thonke ◽  
R. Sauer ◽  
D. G. Ebling ◽  
L. Steinke

We report on the time-resolved luminescence of the defect-related violet band from undoped AlN epitaxial layers grown on sapphire and SiC. For both measurements in photoluminescence and in cathodoluminescence a decay of algebraic nature at long times is observed. This is typical for donor-acceptor pair transitions. We compare the behavior of this band to that of the generically yellow luminescence of GaN.


1999 ◽  
Vol 75 (9) ◽  
pp. 1243-1245 ◽  
Author(s):  
I. Kuskovsky ◽  
D. Li ◽  
G. F. Neumark ◽  
V. N. Bondarev ◽  
P. V. Pikhitsa

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