Topcoat and Resist Processes for Immersion Lithography

2009 ◽  
pp. 87-110
Keyword(s):  
Immersion Lithography

Feasibility of 37-nm half-pitch with ArF high-index immersion lithography

2007 ◽  
Author(s):  
Yoshiyuki Sekine ◽  
Miyoko Kawashima ◽  
Eiji Sakamoto ◽  
Keita Sakai ◽  
Akihiro Yamada ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography

scholarly journals Novel high-index resists for 193-nm immersion lithography and beyond

2007 ◽  
Author(s):  
Idriss Blakey ◽  
Lan Chen ◽  
Bronwin Dargaville ◽  
Heping Liu ◽  
Andrew Whittaker ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography ◽  
193 Nm

Defect control of immersion lithography with top coat material

2005 ◽  
Author(s):  
T. Ando ◽  
T. Takayama ◽  
H. Tsuji ◽  
K. Ishizuka ◽  
M. Yoshida ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Defect Control ◽  
Coat Material

scholarly journals High Refractive Index Fluid for Next Generation ArF Immersion Lithography

2006 ◽  
Vol 19 (5) ◽  
pp. 641-646 ◽  
Author(s):  
Taiichi Furukawa ◽  
Katsuhiko Hieda ◽  
Yong Wang ◽  
Takashi Miyamatsu ◽  
Kinji Yamada ◽  
...  
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Next Generation ◽  
Immersion Lithography

scholarly journals Numerical Investigations on Requirements for BARC Materials for Hyper NA Immersion Lithography

2005 ◽  
Vol 18 (5) ◽  
pp. 587-592 ◽  
Author(s):  
Nobuyuki Matsuzawa ◽  
Yoko Watanabe ◽  
Boontarika Thuunakart ◽  
Ken Ozawa ◽  
Yuko Yamaguchi ◽  
...  
Keyword(s):  
Numerical Investigations ◽  
Immersion Lithography

Extending immersion lithography down to 1x nm production nodes

2013 ◽  
Author(s):  
Wim P. de Boeij ◽  
Remi Pieternella ◽  
Igor Bouchoms ◽  
Martijn Leenders ◽  
Marjan Hoofman ◽  
...  
Keyword(s):  
Immersion Lithography
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