A High Throughput Electron Lithography System Using A Field Emission Gun

1989 ◽  
Author(s):  
W. B. Thompson ◽  
Y. Nakagawa ◽  
M. Hassel Shearer ◽  
H. Nakazawa ◽  
H. Takemura ◽  
...  
2021 ◽  
Vol 27 (S1) ◽  
pp. 1634-1636
Author(s):  
Akihiro Oosaki ◽  
Naoki Hosogi ◽  
Fumiaki Makino ◽  
Sohei Motoki ◽  
Isamu Ishikawa ◽  
...  

1990 ◽  
Vol 11 (1-4) ◽  
pp. 375-378 ◽  
Author(s):  
S.J. Clements ◽  
R.S. Baulcomb ◽  
C.B. Rogers ◽  
A.P. Wright ◽  
A.S. Gozdz

2009 ◽  
Vol 36 (6Part8) ◽  
pp. 2513-2513
Author(s):  
R Peng ◽  
J Zhang ◽  
X Calderon-Colon ◽  
E Quan ◽  
S Wang ◽  
...  

2001 ◽  
Vol 57-58 ◽  
pp. 155-161 ◽  
Author(s):  
M.J. Wieland ◽  
B.J. Kampherbeek ◽  
P. Addessi ◽  
P. Kruit

2000 ◽  
Author(s):  
N. William Parker ◽  
Alan D. Brodie ◽  
John H. McCoy

Author(s):  
Mitsuki Ito ◽  
Kohei Morihara ◽  
Takahiro Toyonaka ◽  
Kazuki Takikawa ◽  
Jun-ichi Shirakashi

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