Electron optics for high throughput electron beam lithography system

1991 ◽  
Vol 9 (6) ◽  
pp. 2940 ◽  
Author(s):  
Yasunari Sohda
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Electron Beam Lithography ◽  
Electron Optics ◽  
Lithography System

Variably shaped electron beam lithography system, EB55: II Electron optics

1981 ◽  
Vol 19 (4) ◽  
pp. 1087-1093 ◽  
Author(s):  
Norio Saitou ◽  
Susumu Ozasa ◽  
Tsutomu Komoda ◽  
Goichi Tatsuno ◽  
Yasumichi Uno
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Electron Optics ◽  
Lithography System

Fast Electron Beam Lithography System with 1024 Beams Individually Controlled by Blanking Aperture Array

1993 ◽  
Vol 32 (Part 1, No. 12B) ◽  
pp. 6012-6017 ◽  
Author(s):  
Hiroshi Yasuda ◽  
Soichiro Arai ◽  
Jun-ichi Kai ◽  
Yoshihisa Ooae ◽  
Tomohiko Abe ◽  
...  
Keyword(s):  
Electron Beam ◽  
Fast Electron ◽  
Electron Beam Lithography ◽  
Fast Electron Beam ◽  
Aperture Array ◽  
Lithography System
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