High-throughput NGL electron-beam direct-write lithography system

2000 ◽  
Author(s):  
N. William Parker ◽  
Alan D. Brodie ◽  
John H. McCoy
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Direct Write ◽  
Lithography System

A multiple-electron-beam exposure system for high-throughput, direct-write submicrometer lithography

1981 ◽  
Vol 28 (11) ◽  
pp. 1422-1428 ◽  
Author(s):  
I. Brodie ◽  
E.R. Westerberg ◽  
D.R. Cone ◽  
J.J. Muray ◽  
N. Williams ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Direct Write ◽  
Exposure System

ELECTRON BEAM DIRECT WRITE EFFECTS ON CMOS DEVICES

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-291-C4-294
Author(s):  
K. BARLOW
Keyword(s):  
Electron Beam ◽  
Direct Write
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