The interaction of 193-nm excimer laser irradiation with single-crystal zinc oxide: Positive ion emission

2012 ◽  
Vol 111 (6) ◽  
pp. 063101 ◽  
Author(s):  
Enamul H. Khan ◽  
S. C. Langford ◽  
J. T. Dickinson ◽  
L. A. Boatner
Keyword(s):  
Zinc Oxide ◽  
Single Crystal ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Excimer Laser Irradiation ◽  
Ion Emission ◽  
193 Nm ◽  
Positive Ion

Positive ion emission from oxidized aluminum during ultraviolet excimer laser irradiation

2011 ◽  
Vol 110 (2) ◽  
pp. 023110 ◽  
Author(s):  
Enamul Khan ◽  
S. C. Langford ◽  
J. T. Dickinson
Keyword(s):  
Laser Irradiation ◽  
Excimer Laser ◽  
Excimer Laser Irradiation ◽  
Ion Emission ◽  
Positive Ion

The interaction of 193 nm excimer laser radiation with single-crystal zinc oxide: Neutral atomic zinc and oxygen emission

2013 ◽  
Vol 114 (5) ◽  
pp. 053511 ◽  
Author(s):  
Enamul H. Khan ◽  
S. C. Langford ◽  
J. T. Dickinson ◽  
L. A. Boatner
Keyword(s):  
Zinc Oxide ◽  
Laser Radiation ◽  
Single Crystal ◽  
Excimer Laser ◽  
Excimer Laser Radiation ◽  
193 Nm

A Novel Method for the Preparation of Green Photoluminescent Undoped Zinc Oxide Film Involving Excimer Laser Irradiation of a Sol-Gel-Derived Precursor

2000 ◽  
Vol 39 (Part 2, No. 7B) ◽  
pp. L713-L715 ◽  
Author(s):  
Toshimi Nagase ◽  
Toshihiko Ooie ◽  
Yoji Makita ◽  
Masahiro Nakatsuka ◽  
Kazuo Shinozaki ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Oxide Film ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Sol Gel ◽  
Zinc Oxide Film ◽  
Excimer Laser Irradiation ◽  
Novel Method

Morphology, Structure and Photoluminescence Properties of Zinc Oxide Films Prepared by Excimer Laser Irradiation of Sol–Gel-Derived Precursors

2001 ◽  
Vol 40 (Part 1, No. 11) ◽  
pp. 6296-6303 ◽  
Author(s):  
Toshimi Nagase ◽  
Toshihiko Ooie ◽  
Yoji Makita ◽  
Shuji Kasaishi ◽  
Masahiro Nakatsuka ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Sol Gel ◽  
Oxide Films ◽  
Photoluminescence Properties ◽  
Zinc Oxide Films ◽  
Excimer Laser Irradiation

scholarly journals Matrix Isolation Study of the 193 nm Excimer Laser Photochemistry of Hexafluorobenzene

1994 ◽  
Vol 15 (1) ◽  
pp. 21-32 ◽  
Author(s):  
Jorge L. Laboy ◽  
Bruce S. Ault
Keyword(s):  
Laser Irradiation ◽  
Excimer Laser ◽  
Matrix Isolation ◽  
Electron Trap ◽  
Excimer Laser Irradiation ◽  
193 Nm ◽  
Additional Product

193 nm excimer laser irradiation of Ar/C6F6 samples during deposition onto a cryogenic surface has led to the formation and isolation of a range of products, the dominant being hexafluoro-Dewar benzene. Additional absorptions likely due to the previously unreported hexafluorobenzvalene were observed, along with extensive fragmentation and additional minor products. When either Cl2 or CCl4 was doped into the Ar/C6F6 sample as an electron trap, a number of additional product bands were noted. A few of these were destroyed by subsequent Hg arc irradiation, and at least one is tentatively assigned to the C6F6+ cation. A comparison to previous studies of the photochemistry of C6F6 is made.

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