Image reversal trilayer process using standard positive photoresist

2009 ◽  
Author(s):  
David J. Abdallah ◽  
John Sagan ◽  
Kazunori Kurosawa ◽  
Jin Li ◽  
Yusuke Takano ◽  
...  
Keyword(s):  
Positive Photoresist ◽  
Image Reversal ◽  
Trilayer Process

Image Reversal Characteristics of a Novel Silicone-Based Positive Photoresist (SPP) in Near UV Lithography

1989 ◽  
Vol 28 (Part 1, No. 10) ◽  
pp. 2099-2103 ◽  
Author(s):  
Akinobu Tanaka ◽  
Hiroshi Ban ◽  
Yoshio Kawai
Keyword(s):  
Positive Photoresist ◽  
Uv Lithography ◽  
Image Reversal

Image reversal of positive photoresist: Characterization and modeling

1985 ◽  
Vol 32 (9) ◽  
pp. 1654-1661 ◽  
Author(s):  
H. Klose ◽  
R. Sigush ◽  
W. Arden
Keyword(s):  
Positive Photoresist ◽  
Image Reversal

Fabrication of Fine-Line Pattern with Image Reversal Process

2011 ◽  
Vol 411 ◽  
pp. 474-477 ◽  
Author(s):  
Shuai Bao ◽  
Ai Hua Gao ◽  
Huan Liu ◽  
Wei Guo Liu
Keyword(s):  
Single Layer ◽  
Line Pattern ◽  
Positive Photoresist ◽  
Saw Devices ◽  
Reversal Process ◽  
Flood Exposure ◽  
Photoresist Film ◽  
Electrode Fabrication ◽  
Lift Off ◽  
Image Reversal

This paper describes a simple and effective lift-off method that relies upon a single layer of positive photoresist and lithography technology. We have succeeded in patterning narrow lines in a photoresist film by image reversal process. Image reversal with AZ 5214-E resist is characterized by contact lithography. A process of patterning different line widths was developed based on image reversal technology, using AZ5214-E, followed by pre-bake, exposure, reversal bake, flood exposure and development. We could obtain very neat patterns with 2-5μm dimensions and their relative features have been supported by scanning electron microscope (SEM) pictures. The application of the proposed process is suitable for the electrode fabrication in MEMS SAW devices.

Formation of a Positive Photoresist Thin Film by Spin Coating: Influence of Atmospheric Humidity

1997 ◽  
Vol 36 (Part 1, No. 11) ◽  
pp. 7041-7047 ◽  
Author(s):  
Toshio Yada ◽  
Taro Maejima ◽  
Masaru Aoki
Keyword(s):  
Thin Film ◽  
Spin Coating ◽  
Atmospheric Humidity ◽  
Positive Photoresist

A new ZEP520/P(MMA-MAA)/ZEP520 trilayer process for T-shaped gate using synchrotron-based proximity x-ray lithography

2005 ◽  
Author(s):  
Changqing Xie ◽  
Dapeng Chen ◽  
Jiebing Niu ◽  
Ming Liu ◽  
Tianchun Ye ◽  
...  
Keyword(s):  
X Ray ◽  
Trilayer Process
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