A new ZEP520/P(MMA-MAA)/ZEP520 trilayer process for T-shaped gate using synchrotron-based proximity x-ray lithography
2011 ◽
Vol 29
(6)
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pp. 06FG02
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1993 ◽
Vol 214
(3-4)
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pp. 345-349
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1994 ◽
Vol 144
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pp. 275-277
1988 ◽
Vol 102
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pp. 259-261
1978 ◽
Vol 36
(2)
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pp. 176-177