Ultimate contact hole resolution using immersion lithography with line/space imaging

2009 ◽  
Author(s):  
V. Truffert ◽  
J. Bekaert ◽  
F. Lazzarino ◽  
M. Maenhoudt ◽  
A. Miller ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Line Space

Patterning of 25 nm Contact Holes at 90 nm Pitch: Combination of Line/Space Double Exposure Immersion Lithography and Plasma-Assisted Shrink Technology

2011 ◽  
Vol 50 (8S1) ◽  
pp. 08JE07 ◽  
Author(s):  
Jean-François de Marneffe ◽  
Frédéric Lazzarino ◽  
Danny Goossens ◽  
Alain Vandervorst ◽  
Olivier Richard ◽  
...  
Keyword(s):  
Double Exposure ◽  
Immersion Lithography ◽  
Line Space

Patterning of 25 nm Contact Holes at 90 nm Pitch: Combination of Line/Space Double Exposure Immersion Lithography and Plasma-Assisted Shrink Technology

2011 ◽  
Vol 50 (8) ◽  
pp. 08JE07
Author(s):  
Jean-François de Marneffe ◽  
Frédéric Lazzarino ◽  
Danny Goossens ◽  
Alain Vandervorst ◽  
Olivier Richard ◽  
...  
Keyword(s):  
Double Exposure ◽  
Immersion Lithography ◽  
Line Space

Anastigmatic design of imaging spectrometer with varied line-space convex grating

2020 ◽  
Vol 28 (10) ◽  
pp. 2103-2111
Author(s):  
Mei-hong ZHAO ◽  
◽  
Xin-yu WANG ◽  
Yan-xiu JIANG ◽  
Shuo YANG ◽  
...  
Keyword(s):  
Imaging Spectrometer ◽  
Line Space

Feasibility of 37-nm half-pitch with ArF high-index immersion lithography

2007 ◽  
Author(s):  
Yoshiyuki Sekine ◽  
Miyoko Kawashima ◽  
Eiji Sakamoto ◽  
Keita Sakai ◽  
Akihiro Yamada ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography

scholarly journals Novel high-index resists for 193-nm immersion lithography and beyond

2007 ◽  
Author(s):  
Idriss Blakey ◽  
Lan Chen ◽  
Bronwin Dargaville ◽  
Heping Liu ◽  
Andrew Whittaker ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography ◽  
193 Nm

Defect control of immersion lithography with top coat material

2005 ◽  
Author(s):  
T. Ando ◽  
T. Takayama ◽  
H. Tsuji ◽  
K. Ishizuka ◽  
M. Yoshida ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Defect Control ◽  
Coat Material

scholarly journals High Refractive Index Fluid for Next Generation ArF Immersion Lithography

2006 ◽  
Vol 19 (5) ◽  
pp. 641-646 ◽  
Author(s):  
Taiichi Furukawa ◽  
Katsuhiko Hieda ◽  
Yong Wang ◽  
Takashi Miyamatsu ◽  
Kinji Yamada ◽  
...  
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Next Generation ◽  
Immersion Lithography
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