High refractive-index resists composed of anionic photoacid generator (PAG) bound polymers for 193 nm immersion lithography

2008 ◽  
Author(s):  
Kenneth E. Gonsalves ◽  
Mingxing Wang ◽  
Narahari S. Pujari
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Immersion Lithography ◽  
193 Nm ◽  
Photoacid Generator

High refractive index fluids for second-generation 193-nm immersion lithography

2007 ◽  
Author(s):  
Akifumi Kagayama ◽  
Hiroko Wachi ◽  
Yoshimichi Namai ◽  
Shin Fukuda
Keyword(s):  
Refractive Index ◽  
Second Generation ◽  
High Refractive Index ◽  
Immersion Lithography ◽  
193 Nm

High refractive index nanoparticle fluids for 193-nm immersion lithography

2009 ◽  
Author(s):  
Markos Trikeriotis ◽  
Robert Rodriguez ◽  
Michael F. Zettel ◽  
Aristeidis Bakandritsos ◽  
Woo Jin Bae ◽  
...  
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Immersion Lithography ◽  
193 Nm

A study of 193-nm immersion lithography using novel high refractive index fluids

2006 ◽  
Vol 83 (4-9) ◽  
pp. 651-654 ◽  
Author(s):  
Julius Santillan ◽  
Akihiko Otoguro ◽  
Toshiro Itani ◽  
Kiyoshi Fujii ◽  
Akifumi Kagayama ◽  
...  
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Immersion Lithography ◽  
193 Nm

scholarly journals Synthesis of high-refractive index sulfur containing polymers for 193-nm immersion lithography; a progress report

2006 ◽  
Author(s):  
Idriss Blakey ◽  
Will Conley ◽  
Graeme A. George ◽  
David J. T. Hill ◽  
Heping Liu ◽  
...  
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Progress Report ◽  
Immersion Lithography ◽  
193 Nm ◽  
Sulfur Containing

scholarly journals High refractive index immersion fluids for 193 nm immersion lithography

2005 ◽  
Author(s):  
Bridgette Budhlall ◽  
Gene Parris ◽  
Peng Zhang ◽  
Xiaoping Gao ◽  
Zarka Zarkov ◽  
...  
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Immersion Lithography ◽  
193 Nm

scholarly journals High Refractive Index Fluid for Next Generation ArF Immersion Lithography

2006 ◽  
Vol 19 (5) ◽  
pp. 641-646 ◽  
Author(s):  
Taiichi Furukawa ◽  
Katsuhiko Hieda ◽  
Yong Wang ◽  
Takashi Miyamatsu ◽  
Kinji Yamada ◽  
...  
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Next Generation ◽  
Immersion Lithography

High refractive index materials design for the next generation ArF immersion lithography

2008 ◽  
Author(s):  
Taiichi Furukawa ◽  
Takanori Kishida ◽  
Kyouyuu Yasuda ◽  
Tsutomu Shimokawa ◽  
Zhi Liu ◽  
...  
Keyword(s):  
Refractive Index ◽  
Materials Design ◽  
High Refractive Index ◽  
Next Generation ◽  
Immersion Lithography

Prediction of imaging performance of immersion lithography using high refractive index fluid

2008 ◽  
Author(s):  
Takashi Sato ◽  
Masamitsu Itoh ◽  
Akiko Mimotogi ◽  
Shoji Mimotogi ◽  
Kazuya Sato ◽  
...  
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Immersion Lithography ◽  
Imaging Performance

Novel high refractive index fluids for 193nm immersion lithography

2006 ◽  
Author(s):  
Julius Santillan ◽  
Akihiko Otoguro ◽  
Toshiro Itani ◽  
Kiyoshi Fujii ◽  
Akifumi Kagayama ◽  
...  
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Immersion Lithography

Material design for immersion lithography with high refractive index fluid (HIF)

2005 ◽  
Author(s):  
Takashi Miyamatsu ◽  
Yong Wang ◽  
Motoyuki Shima ◽  
Shiro Kusumoto ◽  
Takashi Chiba ◽  
...  
Keyword(s):  
Refractive Index ◽  
Material Design ◽  
High Refractive Index ◽  
Immersion Lithography
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