Comparing the transient response of a resistive-type sensor with a thin film thermocouple during the post-exposure bake process

2004 ◽  
Author(s):  
Kenneth G. Kreider ◽  
David P. DeWitt ◽  
Joel B. Fowler ◽  
James E. Proctor ◽  
William A. Kimes ◽  
...  
Keyword(s):  
Thin Film ◽  
Transient Response ◽  
Post Exposure ◽  
Thin Film Thermocouple ◽  
Post Exposure Bake ◽  
Resistive Type

A New Scanning Thermal Microprobe

1997 ◽  
Vol 503 ◽  
Author(s):  
Yongxia Zhang ◽  
Yanwei Zhang ◽  
Juliana Blaser ◽  
T. S. Sriiram ◽  
R. B. Marcus
Keyword(s):  
Thin Film ◽  
High Resolution ◽  
Thermal Response ◽  
Temperature Sensing ◽  
Thermal Sensor ◽  
Atomic Force ◽  
Thin Film Thermocouple ◽  
Processing Steps ◽  
Thermocouple Junction

ABSTRACTA thermal microprobe has been designed and built for high resolution temperature sensing. The thermal sensor is a thin-film thermocouple junction at the tip of an Atomic Force Microprobe (AFM) silicon probe needle. Only wafer-stage processing steps are used for the fabrication. The thermal response over the range 25–s 4.5–rovolts per degree C and is linear.

A novel post exposure bake technique to improve CD uniformity over product wafers

2005 ◽  
Author(s):  
Tomoyuki Takeishi ◽  
K. Hayasaki ◽  
Tsuyoshi Shibata
Keyword(s):  
Post Exposure ◽  
Post Exposure Bake

Frequency and transient response of yoke flux for 45/55 NiFe and CoTaZr thin film write heads

1999 ◽  
Vol 35 (5) ◽  
pp. 2508-2510 ◽  
Author(s):  
J. Jury ◽  
P. George ◽  
J.H. Judy
Keyword(s):  
Thin Film ◽  
Transient Response ◽  
Write Heads

Effect and procedures of post-exposure bake temperature optimization on the CD uniformity in a mass production environment

2007 ◽  
Author(s):  
Kirsten Ruck ◽  
Heiko Weichert ◽  
Steffen Hornig ◽  
Frank Finger ◽  
Göran Fleischer ◽  
...  
Keyword(s):  
Mass Production ◽  
Production Environment ◽  
Post Exposure ◽  
Temperature Optimization ◽  
Post Exposure Bake

Peltier effect in a co-evaporated Sb2Te3(P)-Bi2Te3(N) thin film thermocouple

2002 ◽  
Vol 408 (1-2) ◽  
pp. 270-274 ◽  
Author(s):  
Helin Zou ◽  
D.M. Rowe ◽  
S.G.K. Williams
Keyword(s):  
Thin Film ◽  
Peltier Effect ◽  
Thin Film Thermocouple

Sub-millisecond post exposure bake of chemically amplified resists by CO 2 laser heat treatment

2010 ◽  
Author(s):  
Byungki Jung ◽  
Jing Sha ◽  
Florencia Paredes ◽  
Christopher K. Ober ◽  
Michael O. Thompson ◽  
...  
Keyword(s):  
Heat Treatment ◽  
Laser Heat Treatment ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Laser Heat ◽  
Post Exposure Bake ◽  
Chemically Amplified Resists

Effect of Post Exposure Bake in Inorganic Electron Beam Resist and Utilizing for Nanoimprint Mold

2009 ◽  
Vol 9 (1) ◽  
pp. 562-566 ◽  
Author(s):  
Miyako Shizuno ◽  
Jun Taniguchi ◽  
Kenta Ogino ◽  
Kiyoshi Ishikawa
Keyword(s):  
Electron Beam ◽  
Post Exposure ◽  
Post Exposure Bake
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