Study of the acid-diffusion effect on line edge roughness using the edge roughness evaluation method

2002 ◽  
Vol 20 (4) ◽  
pp. 1342 ◽  
Author(s):  
Masaki Yoshizawa ◽  
Shigeru Moriya
Keyword(s):  
Evaluation Method ◽  
Line Edge Roughness ◽  
Diffusion Effect ◽  
Acid Diffusion ◽  
Edge Roughness ◽  
On Line ◽  
Roughness Evaluation

Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness

2007 ◽  
Vol 46 (9B) ◽  
pp. 6187-6190 ◽  
Author(s):  
Hiroki Yamamoto ◽  
Takahiro Kozawa ◽  
Akinori Saeki ◽  
Kazumasa Okamoto ◽  
Seiichi Tagawa ◽  
...  
Keyword(s):  
Polymer Structure ◽  
Line Edge Roughness ◽  
Acid Diffusion ◽  
Edge Roughness ◽  
On Line

scholarly journals Influence of Acid Diffusion Length on Line Edge Roughness in KrF Photoresists

2004 ◽  
Vol 17 (3) ◽  
pp. 379-384 ◽  
Author(s):  
Jae Hyun Kim ◽  
Yong-Ho Kim ◽  
Sang Mun Chon ◽  
Tomoki Nagai ◽  
Masahiro Noda ◽  
...  
Keyword(s):  
Diffusion Length ◽  
Line Edge Roughness ◽  
Acid Diffusion ◽  
Edge Roughness ◽  
On Line

scholarly journals Optimization of Nano-Grating Pitch Evaluation Method Based on Line Edge Roughness Analysis

2017 ◽  
Vol 17 (6) ◽  
pp. 264-268 ◽  
Author(s):  
Jie Chen ◽  
Jie Liu ◽  
Xingrui Wang ◽  
Longfei Zhang ◽  
Xiao Deng ◽  
...  
Keyword(s):  
Evaluation Method ◽  
Line Edge Roughness ◽  
Zero Crossing ◽  
Edge Roughness ◽  
Roughness Analysis ◽  
On Line ◽  
Two Parameters ◽  
Atom Lithography ◽  
Positive Relevance

Abstract Pitch uncertainty and line edge roughness are among the critical quality attributes of a pitch standard and normally the analyses of these two parameters are separate. The analysis of self-traceable Cr atom lithography nano-gratings shows a positive relevance and sensitivity between LER and evaluated standard deviation of pitch. Therefore, LER can be used as an aided pre-evaluation parameter for the pitch calculation method, such as the gravity center method or the zero-crossing points method. The optimization of the nano-grating evaluation method helps to obtain the accurate pitch value with fewer measurements and provide a comprehensive characterization of pitch standards.

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