Defect repair for gold absorber/silicon membrane x-ray masks

1991 ◽  
Author(s):  
Diane K. Stewart ◽  
Jacob Fuchs ◽  
Robert A. Grant ◽  
Irving Plotnik
Keyword(s):  
Silicon Membrane ◽  
X Ray ◽  
Defect Repair ◽  
Gold Absorber

Metrology for gold absorber/silicon membrane x-ray reticles

1990 ◽  
Author(s):  
Bernard J. Dardzinski ◽  
Robert A. Grant ◽  
Daniel D. Ball
Keyword(s):  
Silicon Membrane ◽  
X Ray ◽  
Gold Absorber

Roughness Effects During Focused Ion Beam Repair of X-Ray Masks with Polycrystalline Tungsten Absorbers

1992 ◽  
Vol 279 ◽  
Author(s):  
R. R. Kola ◽  
G. K. Celler ◽  
L R. Harriott
Keyword(s):  
Material Removal ◽  
Etch Rate ◽  
Focused Ion Beam ◽  
Removal Rate ◽  
Ion Beam ◽  
Sidewall Roughness ◽  
X Ray ◽  
Polycrystalline Tungsten ◽  
Absorber Material ◽  
Defect Repair

ABSTRACTTungsten is emerging as the absorber material of choice for x-ray masks due to recent advances in the deposition of low stress films. For a practical technology, the masks must be free from defects. These defects may be in the form of excess or missing absorber. Finely focused ion beams have been used for defect repair on x-ray masks, both for removal of excess absorber material by physical sputtering and for addition of absorber material by ion-induced deposition. The eifect of ion channeling in polycrystalline tungsten films is spatially nonuniform material removal during sputtering. Different grains will have significantly different sputtering yields, depending on their orientation with respect to the direction of the ion beam. The repaired features then suffer from roughness on the bottoms and sidewalls of the sputter craters. We have investigated the use of XeF2 assisted sputtering with a 20 keV Ga+ focused ion beam to reduce this roughness. The chemical etching component of the material removal lessens the directional dependence and therefore the roughness during defect repair. It was also found that chromium etch rate was reduced in the presence of XeF2 gas while the etch rate of W was enhanced so that the removal rate of Cr is much less than that of W. We can take advantage of this etch selectivity by using a thin Cr layer under the W absorber as an etch stop layer to eliminate the roughness at the bottom of the features and a thin layer of Cr on top of the W as an etch mask for reducing the sidewall roughness.

Comparison of Dense Versus Porous Hydroxylapatite (HA) Particles for Rat Mandibular Defect Repair

1987 ◽  
Vol 110 ◽  
Author(s):  
Stephen A. Fredette ◽  
Jacob S. Hanker ◽  
Bill C. Terry ◽  
Beverly L. Giammara
Keyword(s):  
Soft Tissue ◽  
Bone Formation ◽  
Cancellous Bone ◽  
New Bone Formation ◽  
Mandibular Ramus ◽  
X Ray ◽  
Fibrovascular Tissue ◽  
Defect Repair ◽  
Mandibular Defect

AbstractRepair was compared in 4.4mm experimental rat mandibular ramus defects implanted with dense or porous HA particles with or without a plaster binder. Animals were sacrificed 6 months postimplantation. Specimens underwent gross, radiographic, histochemical and X-ray microanalytical examination. Gross and radiographic examinations showed good particle containment or retention only in defects filled with implants containing plaster. Only porous HA/plaster filled defects showed bone formation throughout the implant when examined histochemically by the PATS reaction and by X-ray microanalysis. They also showed greater radiographic opacity compared to dense HA/plaster implants. Only porous HA/plaster implants showed macroscopic bone formation. Examination of defects filled with porous HA/plaster or porous HA alone by the PATS reaction showed new cancellous bone around, and through the pores of, retained particles. The dense HA/plaster implants showed some new bone around the rims of the defects with only occasional bony incorporation of an HA particle. Dense particles in other areas showed only soft tissue encapsulation. Defects implanted with dense HA without plaster showed no new bone formation but retained particles were incorporated by fibrovascular tissue.

Annealing behavior of gold absorber in x-ray masks

1992 ◽  
Vol 17 (1-4) ◽  
pp. 189-192 ◽  
Author(s):  
R.E. Acosta ◽  
W.A. Johnson ◽  
B.S. Berry ◽  
W.C. Pritchet
Keyword(s):  
Annealing Behavior ◽  
X Ray ◽  
Gold Absorber

A new operating regime for electroplating the gold absorber on x-ray masks

1994 ◽  
Vol 23 (1-4) ◽  
pp. 235-238 ◽  
Author(s):  
W.J. Dauksher ◽  
D.J. Resnick ◽  
W.A. Johnson ◽  
A.W. Yanof
Keyword(s):  
Operating Regime ◽  
X Ray ◽  
Gold Absorber

Scanning Small- and Wide-Angle X-ray Scattering Microscopy Selectively Probes HA Content in Gelatin/Hydroxyapatite Scaffolds for Osteochondral Defect Repair

2016 ◽  
Vol 8 (13) ◽  
pp. 8728-8736 ◽  
Author(s):  
Davide Altamura ◽  
Stella G. Pastore ◽  
Maria G. Raucci ◽  
Dritan Siliqi ◽  
Fabio De Pascalis ◽  
...  
Keyword(s):  
Osteochondral Defect ◽  
Wide Angle ◽  
X Ray ◽  
X Ray Scattering ◽  
Defect Repair ◽  
Ray Scattering

scholarly journals Pt Deposites on TiO2 for Photocatalytic H2 Evolution: Pt Is Not Only the Cocatalyst, but Also the Defect Repair Agent

Catalysts ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 1047 ◽  
Author(s):  
Zhan Shu ◽  
Yandi Cai ◽  
Jiawei Ji ◽  
Changjin Tang ◽  
Shuohan Yu ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Charge Separation ◽  
H2 Production ◽  
H2 Evolution ◽  
X Ray ◽  
Production Activity ◽  
Defect Repair ◽  
New Perspective ◽  
Photocatalytic H2 Evolution

Pt, as a common cocatalyst, has been widely used in photocatalytic H2 evolution. However, the specific role of Pt in photocatalytic H2 evolution has not been thoroughly studied. In this paper, by employing three Pt sources with different charges (positive, negative and neutral), we systematically studied the charge effect of Pt sources on photocatalytic H2 evolution via TiO2 catalyst. According to the results of Raman, X-ray photoelectron spectroscopy (XPS), recycle experiments and photocurrent characterizations, it was found that TiO2 would produce electropositive defects during photocatalytic H2 evolution, inevitably leading to the decline of H2 production activity. Thanks to the electrostatic interaction, the electronegative Pt source not only promoted charge separation, but preferential deposited on electropositive defects, which acted as the defect repair agent, and thus resulted in the increased photocatalytic stability. This work may provide a new perspective for enhancing photocatalytic stability of hydrogen production.

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