Stress reduction of gold absorber patterns on x-ray masks

1992 ◽  
Vol 10 (6) ◽  
pp. 3155 ◽  
Author(s):  
W. A. Johnson
Keyword(s):  
Stress Reduction ◽  
X Ray ◽  
Gold Absorber

Defect repair for gold absorber/silicon membrane x-ray masks

1991 ◽  
Author(s):  
Diane K. Stewart ◽  
Jacob Fuchs ◽  
Robert A. Grant ◽  
Irving Plotnik
Keyword(s):  
Silicon Membrane ◽  
X Ray ◽  
Defect Repair ◽  
Gold Absorber

Annealing behavior of gold absorber in x-ray masks

1992 ◽  
Vol 17 (1-4) ◽  
pp. 189-192 ◽  
Author(s):  
R.E. Acosta ◽  
W.A. Johnson ◽  
B.S. Berry ◽  
W.C. Pritchet
Keyword(s):  
Annealing Behavior ◽  
X Ray ◽  
Gold Absorber

scholarly journals Evaluation of Weld Filler Alloying Concepts for Residual Stress Engineering by Means of Neutron and X-Ray Diffraction

2014 ◽  
Vol 996 ◽  
pp. 469-474 ◽  
Author(s):  
Arne Kromm
Keyword(s):  
Residual Stress ◽  
Residual Stresses ◽  
Stress Reduction ◽  
Maximum Stress ◽  
Lattice Parameter ◽  
Filler Materials ◽  
X Ray Diffraction ◽  
X Ray ◽  
Stress Control ◽  
Surface Areas

Novel Low Transformation Temperature (LTT-) filler materials are specially designed for controlling residual stresses by means of adjusted martensite formation already during welding. Different alloying concepts compete for maximum stress reduction. Two newly developed LTT-alloys were evaluated concerning their potential for residual stress control. For this purpose residual stresses were determined in the surface and also in sub-surface areas of welded joints using X-ray diffraction and Neutron diffraction taking into account local variations of the unstrained lattice parameter.

Stress Reduction in Multilayers Used for X-Ray and Neutron Optics

2008 ◽  
pp. 371-388
Author(s):  
Thomas Krist ◽  
Anke Teichert ◽  
Evgeni Meltchakov ◽  
Vladimir Vidal ◽  
Erwin Zoethout ◽  
...  
Keyword(s):  
Stress Reduction ◽  
X Ray ◽  
Neutron Optics

A new operating regime for electroplating the gold absorber on x-ray masks

1994 ◽  
Vol 23 (1-4) ◽  
pp. 235-238 ◽  
Author(s):  
W.J. Dauksher ◽  
D.J. Resnick ◽  
W.A. Johnson ◽  
A.W. Yanof
Keyword(s):  
Operating Regime ◽  
X Ray ◽  
Gold Absorber

Metrology for gold absorber/silicon membrane x-ray reticles

1990 ◽  
Author(s):  
Bernard J. Dardzinski ◽  
Robert A. Grant ◽  
Daniel D. Ball
Keyword(s):  
Silicon Membrane ◽  
X Ray ◽  
Gold Absorber

Deep X-Ray Mask With Integrated Actuator for 3D LIGA Process

2002 ◽  
Author(s):  
Kwang-Cheol Lee ◽  
Seung S. Lee
Keyword(s):  
Cross Section ◽  
Absorbed Dose ◽  
Silicon On Insulator ◽  
Comb Drive ◽  
Deep Reactive Ion Etching ◽  
X Ray ◽  
Micro Actuator ◽  
Dose Profile ◽  
Dc Bias ◽  
Gold Absorber

We present a noval method of 3D microfabrication with LIGA process that utilizes a deep X-ray mask in which a microactuator is integrated. The integrated micro-actuator oscillates the X-ray absorber, which is formed on the shuttle mass of the micro-actuator, during X-ray exposures to modify that absorbed dose profile in X-ray resist, typically PMMA. 3D PMMA microstructures according to the modulated dose controur are revealed after GG development. An X-ray mask with integrated comb drive actuator is fabricated using deep reactive ion etching, absorber electroplating, and bulk micromachining with silicon-on-insulator wafer. 1 mm × 1 mm, 20 μm thick silicon shuttle mass as a mask blank is supported by four 1 mm long suspesnsion beams and is driven by the comb electrodes. A 10 μm thick, 50 μm line and spaced gold absorber pattern is electroplated on the shuttle mass before the release step. The fundamental frequency and arnplitured are around 3.6 kHz and 20 μm, respectively, for a dc bias of 100 V and an ac bias of 20 VP-P (peak-peak). Fabricated PMMA microstructure shows 15.4 μm deep, S-shaped cross section in the case of 1.6 kJ cm−3 surface dose and GG development at 35°C for 40 minutes.

scholarly journals Effect of Cold Pressing and Aging on Reduction and Evolution of Quenched Residual Stress for Al-Zn-Mg-Cu T-Type Rib

2021 ◽  
Vol 11 (12) ◽  
pp. 5439
Author(s):  
Yaoqiong Liu ◽  
Tao Zhang ◽  
Hai Gong ◽  
Yunxin Wu
Keyword(s):  
Residual Stress ◽  
Stress Reduction ◽  
Numerical Models ◽  
Maximum Tensile Stress ◽  
Contour Method ◽  
X Ray Diffraction ◽  
Machining Processes ◽  
Heterogeneous Distribution ◽  
Cold Pressing ◽  
X Ray

The preparation of the Al-Zn-Mg-Cu T-type rib consisted of forging, quenching, cold pressing, aging and the final machining processes, and the evolution of residual stress played a significant role in its properties and accuracy. Numerical models were established to investigate the evolution and distribution of residual stress for the T-type rib during the quenching and cold pressing processes. The results showed that the distribution of residual stress at the stiffened area is asymmetrical, which is different from the symmetrical distribution at the smooth area. The cold pressing is beneficial for the reduction of residual stress. The stepwise cold pressing resulted in the heterogeneous distribution of residual stress at the stiffened area and the overlap region. Three comparative T-type ribs were conducted, and their residual stresses were measured using X-ray diffraction and the contour method. A stress reduction of 50% can be obtained at the surfaces of the T-type rib through cold pressing followed by the aging process. The reduction of the maximum tensile stress at the stiffened area of the T-type rib was 42% and 50% for the cold pressing and aging, respectively, which increased to 54% and 60% at the smooth area. The mechanism of the stress reduction during the cold pressing and the aging processes was discussed.

Photoluminescence of Surface Modified Silicon Carbide Nanowires

2011 ◽  
Vol 1350 ◽  
Author(s):  
Polite D. Stewart ◽  
Ryan Rich ◽  
A. Nemashkalo ◽  
T. W. Zerda
Keyword(s):  
Stress Reduction ◽  
Surface Defects ◽  
Average Diameter ◽  
Silicon Powder ◽  
Amorphous Layer ◽  
Silicon Compounds ◽  
X Ray ◽  
Sic Nanowires ◽  
Surface Modified ◽  
Amorphous Sic

ABSTRACTSiC nanowires were produced from carbon nanotubes and nanosize silicon powder in a tube furnace at temperatures between 1100°C and 1350°C. SiC nanowires had average diameter of 30 nm and very narrow size distribution. The surface of the SiC nanowires is covered by an amorphous layer composed of amorphous SiC and various carbon and silicon compounds. The objective of the research was to modify the surface structure of the SiC nanowires, a step necessary for future surface functionalization. The acid etched nanowires were analyzed using FTIR, TEM, x-ray diffraction, and photoluminescence. The concentration of Si-Ox groups in untreated specimens was estimated to account for 1% of the total mass of a 2 nm thick amorphous layer wrapping around all structures. After treatment in HF this concentration was negligibly small. TEM images show that after treatment the amorphous layer was removed but the diameter of the core remained unchanged. The surface was roughened and multiple pits formed on that surface. X-ray line broadening analysis indicates a significant contribution due to stress caused by dislocations and planar faults. After acid etching line narrowing was observed and attributed to stress reduction and elimination of the smallest wires. The photoluminescence signal from as received samples was very weak but increased greatly after acid treatment, indicating that the signal is related to surface defects. Measurements at low temperatures, 8 K, showed peaks due to point and planar defects.

Space and Time Distribution of Hard X-Ray Emission in a Loop at the Beginning of a Flare

1994 ◽  
Vol 144 ◽  
pp. 275-277
Author(s):  
M. Karlický ◽  
J. C. Hénoux
Keyword(s):  
Time Distribution ◽  
Electron Bombardment ◽  
Spatial Evolution ◽  
Superthermal Electrons ◽  
Flare Loop ◽  
X Ray ◽  
Superthermal Electron ◽  
Flare Loops ◽  
Chromospheric Evaporation ◽  
Temporal And Spatial

AbstractUsing a new ID hybrid model of the electron bombardment in flare loops, we study not only the evolution of densities, plasma velocities and temperatures in the loop, but also the temporal and spatial evolution of hard X-ray emission. In the present paper a continuous bombardment by electrons isotropically accelerated at the top of flare loop with a power-law injection distribution function is considered. The computations include the effects of the return-current that reduces significantly the depth of the chromospheric layer which is evaporated. The present modelling is made with superthermal electron parameters corresponding to the classical resistivity regime for an input energy flux of superthermal electrons of 109erg cm−2s−1. It was found that due to the electron bombardment the two chromospheric evaporation waves are generated at both feet of the loop and they propagate up to the top, where they collide and cause temporary density and hard X-ray enhancements.

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