Preliminary lithographic characteristics of an all-organic chemically amplified resist formulation for single-layer deep-UV lithography

1991 ◽  
Author(s):  
Omkaram Nalamasu ◽  
Elsa Reichmanis ◽  
May Cheng ◽  
Victor Pol ◽  
Janet M. Kometani ◽  
...  
Keyword(s):  
Single Layer ◽  
Uv Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Deep Uv

A New Environmentally Stable Posyitve Tone Chemically Amplified Resist System - KRS

1993 ◽  
Vol 324 ◽  
Author(s):  
Wu-Song Iiuang ◽  
Ranee Kwong ◽  
Ahmad Katnani ◽  
Maitoud Khojasteh ◽  
Kim Y. Lee
Keyword(s):  
High Resolution ◽  
High Sensitivity ◽  
Vertical Profiles ◽  
High Contrast ◽  
Uv Lithography ◽  
Chemically Amplified ◽  
Strategic Plans ◽  
Chemically Amplified Resist ◽  
Deep Uv ◽  
Chemically Amplified Photoresist

AbstractIt is known that one of the main shortcomings of chemically amplified resist systems is their sensitivity to airborne base contaminants. The contaminants cause unpredictable linewidth variations deeming the resist incompatible with manufacturing. Besides other issues, this drawback has greatly contributed to the slow introduction of DUV into manufacturing and discouragcd most semiconductor manufactures from including DUV in their strategic plans. In this paper, we present a new positive tone chemically amplified photoresist system which is resilient to airborne base contaminants and it shows stable linewidth for more than 24 hours delay between exposure and development. This resist has high sensitivity (17-18 mj/cm2), high contrast (7), high resolution (0.35 um with λ = 248 rm and NA = 0.37) and large process latitude in deep-UV lithography. This resist also exhibits high resolution (0.1 um in 0.35 um thick resist) in E-beam lithography at a sensitivity of about 10 uC/cm2. Both lithographic systems (deep-UV and E-beam) yield nearly vertical profiles in the resist images.

Development of a chemically amplified positive resist material for single-layer deep-UV lithography

1990 ◽  
Author(s):  
Omkaram Nalamasu ◽  
May Cheng ◽  
Janet M. Kometani ◽  
Sheila Vaidya ◽  
Elsa Reichmanis ◽  
...  
Keyword(s):  
Single Layer ◽  
Uv Lithography ◽  
Chemically Amplified ◽  
Deep Uv ◽  
Positive Resist

Positive chemically amplified resist for deep-UV lithography

1993 ◽  
Author(s):  
Omkaram Nalamasu ◽  
Allen G. Timko ◽  
May Cheng ◽  
Janet M. Kometani ◽  
Mary E. Galvin-Donoghue ◽  
...  
Keyword(s):  
Uv Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Deep Uv

Comparison of the lithographic characteristics of t-BOC-based chemically amplified resist system under deep-UV and electron-beam exposures

1994 ◽  
Author(s):  
Regine G. Tarascon-Auriol ◽  
Anthony E. Novembre ◽  
Woon W. Tai ◽  
Linus A. Fetter ◽  
Janet M. Kometani ◽  
...  
Keyword(s):  
Electron Beam ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Deep Uv

Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist

1996 ◽  
Author(s):  
Yasunobu Onishi ◽  
Kazuo Sato ◽  
Kenzi Chiba ◽  
Masafumi Asano ◽  
Hirokazu Niki ◽  
...  
Keyword(s):  
Uv Lithography ◽  
Chemically Amplified ◽  
Deep Uv ◽  
Positive Resist

Deep-UV positive-tone dry-development process using chemically amplified resist and its application to 256 Mbit DRAM

1993 ◽  
Author(s):  
Woo-Sung Han ◽  
Joong-Hyun Lee ◽  
Jung-Chul Park ◽  
Choon-Geun Park ◽  
Hoyoung Kang ◽  
...  
Keyword(s):  
Development Process ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Deep Uv

Poly(t-BOC-styrene sulfone)-based chemically amplified resists for deep-UV lithography

1989 ◽  
Vol 29 (13) ◽  
pp. 850-855 ◽  
Author(s):  
R. G. Tarascon ◽  
E. Reichmanis ◽  
F. M. Houlihan ◽  
A. Shugard ◽  
L. F. Thompson
Keyword(s):  
Uv Lithography ◽  
Chemically Amplified ◽  
Deep Uv ◽  
Chemically Amplified Resists

scholarly journals A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep-UV and Vacuum-UV Lithography.

2002 ◽  
Vol 15 (3) ◽  
pp. 367-370 ◽  
Author(s):  
Kazuyuki SUGITA ◽  
Masahiro YAMASHITA ◽  
Kieko HARADA ◽  
Masahito KUSHIDA ◽  
Kyoichi SAITO
Keyword(s):  
Single Layer ◽  
Chemical Amplification ◽  
Uv Lithography ◽  
Deep Uv ◽  
Vacuum Uv

Novel single-layer chemically amplified resist for 193-nm lithography

1997 ◽  
Author(s):  
Sang-Jun Choi ◽  
Yool Kang ◽  
Dong-Won Jung ◽  
Chun-Geun Park ◽  
Joo-Tae Moon
Keyword(s):  
Single Layer ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
193 Nm
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