Application of a reaction-diffusion model for negative chemically amplified resists to determine electron-beam proximity correction parameters

1996 ◽  
Vol 14 (6) ◽  
pp. 4252 ◽  
Author(s):  
N. Glezos
Keyword(s):  
Electron Beam ◽  
Diffusion Model ◽  
Reaction Diffusion ◽  
Chemically Amplified ◽  
Reaction Diffusion Model ◽  
Chemically Amplified Resists

scholarly journals A new analyzing technique for nonlinear time fractional Cauchy reaction-diffusion model equations

2020 ◽  
Vol 19 ◽  
pp. 103462 ◽  
Author(s):  
Hijaz Ahmad ◽  
Tufail A. Khan ◽  
Imtiaz Ahmad ◽  
Predrag S. Stanimirović ◽  
Yu-Ming Chu
Keyword(s):  
Diffusion Model ◽  
Reaction Diffusion ◽  
Reaction Diffusion Model ◽  
Model Equations
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