Evaluation of Shipley XP2040D positive chemically amplified resist for SCALPEL mask fabrication

2001 ◽  
Author(s):  
Bing Lu ◽  
Zorian S. Masnyj ◽  
Pawitter J. S. Mangat ◽  
Kevin J. Nordquist ◽  
Eric S. Ainley ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Mask Fabrication

Evaluation of a high-performance chemically amplified resist for EUVL mask fabrication

2003 ◽  
Author(s):  
Bing Lu ◽  
Eric Weisbrod ◽  
Pawitter J. S. Mangat ◽  
Kevin J. Nordquist ◽  
Eric S. Ainley
Keyword(s):  
High Performance ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Mask Fabrication

Chemically Amplified Resist Approaches for E-beam Lithography Mask Fabrication

2001 ◽  
Vol 705 ◽  
Author(s):  
J.R. Maldonado ◽  
M. Angelopoulos ◽  
W. Huang ◽  
R. L. Brainard ◽  
J. M. Guevremont ◽  
...  
Keyword(s):  
High Sensitivity ◽  
Chemical Amplification ◽  
Joint Program ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Si Doped ◽  
Improved Performance ◽  
Mask Fabrication

AbstractThis paper describes stable, high sensitivity (5-10 μC/cm2 at 50 kV) e-beam resist systems utilizing chemical amplification suitable for mask fabrication for device generations below 100 nm. In particular, two resist systems with improved performance for mask fabrication developed in a joint program by Etec, IBM and Shipley will be described: a Si- doped version of the IBM KRS-XE resist (now commercially available) developed at IBM Research, and a new MANA resist developed at Shipley. Commercialization issues for mask e-beam resists also will be discussed.

Characterization of an acetal-based chemically amplified resist for 257-nm laser mask fabrication

2001 ◽  
Author(s):  
Benjamen M. Rathsack ◽  
Cyrus E. Tabery ◽  
Jeff A. Albelo ◽  
Peter D. Buck ◽  
C. Grant Willson
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Mask Fabrication

UVN2-negative chemically amplified resist optimization for x-ray mask fabrication

1999 ◽  
Author(s):  
Janet M. Rocque ◽  
Michael J. Lercel ◽  
Cameron J. Brooks ◽  
Richard W. Henry ◽  
Douglas E. Benoit
Keyword(s):  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Mask Fabrication

Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication

2001 ◽  
Author(s):  
Christopher Magg ◽  
Michael J. Lercel ◽  
Mark Lawliss ◽  
Ranee W. Kwong ◽  
Wu-Song Huang ◽  
...  
Keyword(s):  
Next Generation ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Next Generation Lithography ◽  
Mask Fabrication

Chemically amplified resist technology for i-line applications

1998 ◽  
Author(s):  
Medhat A. Toukhy ◽  
Sanjay Malik ◽  
Andrew J. Blakeney ◽  
Karin R. Schlicht
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist

Sub-150-nm electron-beam lithography using AZPN114 chemically amplified resist

1997 ◽  
Author(s):  
Zheng Cui ◽  
R. A. Moody ◽  
Ian M. Loader ◽  
John G. Watson ◽  
Philip D. Prewett
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Postexposure Delay Effect on Linewidth Variation in Base Added Chemically Amplified Resist

2000 ◽  
Vol 147 (10) ◽  
pp. 3833 ◽  
Author(s):  
Chin-Yu Ku ◽  
Jia-Min Shieh ◽  
Tsann-Bim Chiou ◽  
Hwang-Kuen Lin ◽  
Tan Fu Lei
Keyword(s):  
Delay Effect ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Airborne Contamination of a Chemically Amplified Resist. 2. Effect of Polymer Film Properties on Contamination Rate

1994 ◽  
Vol 6 (4) ◽  
pp. 481-488 ◽  
Author(s):  
William D. Hinsberg ◽  
Scott A. MacDonald ◽  
Nicholas J. Clecak ◽  
Clinton D. Snyder
Keyword(s):  
Polymer Film ◽  
Contamination Rate ◽  
Film Properties ◽  
Chemically Amplified ◽  
Airborne Contamination ◽  
Chemically Amplified Resist
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