193-nm chemically amplified positive resists based on poly(norbornene-alt-maleic anhydride) with plasticizing additives

2000 ◽  
Author(s):  
Hiroshi Yoshino ◽  
Toshiro Itani ◽  
Michiya Takimoto ◽  
Hiroyoshi Tanabe
Keyword(s):  
Maleic Anhydride ◽  
Chemically Amplified ◽  
193 Nm

Adhesion-promoted copolymers based on norbornene derivatives and maleic anhydride for 193-nm photoresists

Polymer ◽  
2000 ◽  
Vol 41 (22) ◽  
pp. 8035-8039 ◽  
Author(s):  
J.-B Kim ◽  
H.-J Yun ◽  
Y.-G Kwon ◽  
B.-W Lee
Keyword(s):  
Maleic Anhydride ◽  
193 Nm ◽  
Norbornene Derivatives

Synthesis of Cycloolefin−Maleic Anhydride Alternating Copolymers for 193 nm Imaging

1997 ◽  
Vol 30 (21) ◽  
pp. 6517-6524 ◽  
Author(s):  
F. M. Houlihan ◽  
T. I. Wallow ◽  
O. Nalamasu ◽  
E. Reichmanis
Keyword(s):  
Maleic Anhydride ◽  
Alternating Copolymers ◽  
193 Nm

Base additives for use in a single layer 193-nm resist based upon poly(norbornene/maleic anhydride/acrylic acid/ tert -butyl acrylate)

2001 ◽  
Author(s):  
Francis M. Houlihan ◽  
Donna Person ◽  
Omkaram Nalamasu ◽  
Ilya Rushkin ◽  
Ognian N. Dimov ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Acrylic Acid ◽  
Butyl Acrylate ◽  
Single Layer ◽  
Tert Butyl ◽  
193 Nm

Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology

2003 ◽  
Author(s):  
Hyun-Sang Joo ◽  
Dong Chul Seo ◽  
Chang Min Kim ◽  
Young Taek Lim ◽  
Seong Duk Cho ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Flow Process ◽  
193 Nm

Chemically amplified photoresists for 193-nm photolithography: Effect of molecular structure and photonic parameters on photopatterning

2010 ◽  
Vol 48 (6) ◽  
pp. 1271-1277 ◽  
Author(s):  
Hassan Ridaoui ◽  
Ali Dirani ◽  
Olivier Soppera ◽  
Esma Ismailova ◽  
Cyril Brochon ◽  
...  
Keyword(s):  
Molecular Structure ◽  
Chemically Amplified ◽  
193 Nm

Microlithographic Assessment of a Novel Family of Transparent and Etch-Resistant Chemically Amplified 193-nm Resists Based on Cyclopolymers

2001 ◽  
Vol 13 (11) ◽  
pp. 4147-4153 ◽  
Author(s):  
John M. Klopp ◽  
Dario Pasini ◽  
Jeffrey D. Byers ◽  
C. Grant Willson ◽  
Jean M. J. Fréchet
Keyword(s):  
Chemically Amplified ◽  
193 Nm

Cycloolefin/maleic anhydride copolymers for 193-nm resist compositions

1999 ◽  
Author(s):  
M. D. Rahman ◽  
Ralph R. Dammel ◽  
Michelle M. Cook ◽  
Stanley A. Ficner ◽  
Munirathna Padmanaban ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
193 Nm ◽  
Maleic Anhydride Copolymers

Refractive index change during exposure for 193-nm chemically amplified resists

1999 ◽  
Author(s):  
Hye-Keun Oh ◽  
Young-Soo Sohn ◽  
Moon-Gyu Sung ◽  
Young-Mi Lee ◽  
Eun-Mi Lee ◽  
...  
Keyword(s):  
Refractive Index ◽  
Refractive Index Change ◽  
Index Change ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm
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