Chemically amplified negative-tone resist using novel acryl polymer for 193-nm lithography

1999 ◽  
Author(s):  
Hideo Hada ◽  
Takeshi Iwai ◽  
Toshimasa Nakayama
Keyword(s):  
Chemically Amplified ◽  
Negative Tone ◽  
193 Nm

Resist composition effects on ultimate resolution of negative-tone chemically amplified resists

2001 ◽  
Author(s):  
Laurent Pain ◽  
C. Gourgon ◽  
K. Patterson ◽  
B. Scarfogliere ◽  
Serge V. Tedesco ◽  
...  
Keyword(s):  
Composition Effects ◽  
Chemically Amplified ◽  
Negative Tone ◽  
Chemically Amplified Resists

scholarly journals Negative-tone cycloolefin photoresist for 193-nm lithography

2001 ◽  
Author(s):  
ShihChi Fu ◽  
Kuo-Huang Hsieh ◽  
Lon A. Wang
Keyword(s):  
Negative Tone ◽  
193 Nm

INR negative resist: a negative-tone I-line chemically amplified photoresist

1994 ◽  
Author(s):  
Leo L. Linehan ◽  
Gary T. Spinillo ◽  
Randolph S. Smith ◽  
Wayne M. Moreau ◽  
Barry C. McCormick ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist ◽  
Negative Tone

Chemically amplified photoresists for 193-nm photolithography: Effect of molecular structure and photonic parameters on photopatterning

2010 ◽  
Vol 48 (6) ◽  
pp. 1271-1277 ◽  
Author(s):  
Hassan Ridaoui ◽  
Ali Dirani ◽  
Olivier Soppera ◽  
Esma Ismailova ◽  
Cyril Brochon ◽  
...  
Keyword(s):  
Molecular Structure ◽  
Chemically Amplified ◽  
193 Nm

Microlithographic Assessment of a Novel Family of Transparent and Etch-Resistant Chemically Amplified 193-nm Resists Based on Cyclopolymers

2001 ◽  
Vol 13 (11) ◽  
pp. 4147-4153 ◽  
Author(s):  
John M. Klopp ◽  
Dario Pasini ◽  
Jeffrey D. Byers ◽  
C. Grant Willson ◽  
Jean M. J. Fréchet
Keyword(s):  
Chemically Amplified ◽  
193 Nm

Refractive index change during exposure for 193-nm chemically amplified resists

1999 ◽  
Author(s):  
Hye-Keun Oh ◽  
Young-Soo Sohn ◽  
Moon-Gyu Sung ◽  
Young-Mi Lee ◽  
Eun-Mi Lee ◽  
...  
Keyword(s):  
Refractive Index ◽  
Refractive Index Change ◽  
Index Change ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm
Sign in / Sign up

Export Citation Format

Share Document