INR negative resist: a negative-tone I-line chemically amplified photoresist

1994 ◽  
Author(s):  
Leo L. Linehan ◽  
Gary T. Spinillo ◽  
Randolph S. Smith ◽  
Wayne M. Moreau ◽  
Barry C. McCormick ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist ◽  
Negative Tone

Resist composition effects on ultimate resolution of negative-tone chemically amplified resists

2001 ◽  
Author(s):  
Laurent Pain ◽  
C. Gourgon ◽  
K. Patterson ◽  
B. Scarfogliere ◽  
Serge V. Tedesco ◽  
...  
Keyword(s):  
Composition Effects ◽  
Chemically Amplified ◽  
Negative Tone ◽  
Chemically Amplified Resists

Performance of a 55-micron copper pillar bump process using a positive thick chemically amplified photoresist

2007 ◽  
Author(s):  
Dennis Crapse ◽  
Warren W. Flack ◽  
Ha-Ai Nguyen ◽  
Elliott Capsuto ◽  
Craig McEwen
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist

Effect of surfactant-added developer on development of the chemically amplified photoresist

2000 ◽  
Author(s):  
Satoshi Kawada ◽  
Yukio Tamai ◽  
Shunkichi Omae ◽  
Tadahiro Ohmi
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist

scholarly journals Chemically Amplified Photoresist for Electron Beam Lithography

2003 ◽  
Vol 16 (3) ◽  
pp. 451-454 ◽  
Author(s):  
Youngmin Choi ◽  
Sang-Wook Park ◽  
Yongil Kim ◽  
Haiwon Lee
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Photoresist
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