Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison
1987 ◽
Vol 45
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pp. 936-937
1991 ◽
Vol 65
(02)
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pp. 202-205
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2008 ◽
Vol 128
(10)
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pp. 668-668
Keyword(s):
2020 ◽
Vol 2020
(7)
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pp. 143-1-143-6
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Keyword(s):
2014 ◽
Vol 143
(5)
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pp. 1033-1036
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Keyword(s):