28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV lithography
1969 ◽
Vol 27
◽
pp. 166-167
Keyword(s):
1987 ◽
Vol 45
◽
pp. 936-937
Keyword(s):
1999 ◽
Vol 09
(PR8)
◽
pp. Pr8-65-Pr8-72
◽
1999 ◽
Vol 09
(PR3)
◽
pp. Pr3-343-Pr3-348