Comparison study for 3x-nm contact hole CD uniformity between EUV lithography and ArF immersion double patterning

2012 ◽  
Author(s):  
Keundo Ban ◽  
Junggun Heo ◽  
Hyunkyung Shim ◽  
Minkyung Park ◽  
Kilyoung Lee ◽  
...  
Keyword(s):  
Comparison Study ◽  
Euv Lithography ◽  
Double Patterning

Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison

2018 ◽  
Author(s):  
Weimin Gao ◽  
Vincent Wiaux ◽  
Wolfgang Hoppe ◽  
Lawrence S. Melvin ◽  
Vicky Philipsen ◽  
...  
Keyword(s):  
Single Exposure ◽  
Euv Lithography ◽  
Double Patterning

Shari’ah Audit Disclosure in annual reports: A comparison study between Bahrain and Malaysian Islamic Financial Institutions

2016 ◽  
Vol 4 (2) ◽  
pp. 202-218
Author(s):  
ڕێبوار محمد احمد ◽  
◽  
هێمن محمد عزیز ◽  
بصيرة ماجيد نجم ◽  
◽  
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Keyword(s):  
Financial Institutions ◽  
Annual Reports ◽  
Comparison Study ◽  
Islamic Financial Institutions

414. Comparison Study Between

2000 ◽  
Author(s):  
N. Wegener ◽  
D. Lillquist ◽  
M. Taylor
Keyword(s):  
Comparison Study
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