Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters

1990 ◽  
Author(s):  
J. Kolbe
Keyword(s):  
Process Parameters ◽  
Optical Constants ◽  
Dielectric Coatings ◽  
Laser Induced Damage ◽  
193 Nm

scholarly journals Laser-induced damage of intrinsic and extrinsic defects by picosecond pulses on multilayer dielectric coatings for petawatt-class lasers

2016 ◽  
Vol 56 (1) ◽  
pp. 011008 ◽  
Author(s):  
Raluca A. Negres ◽  
Christopher W. Carr ◽  
Ted A. Laurence ◽  
Ken Stanion ◽  
Gabe Guss ◽  
...  
Keyword(s):  
Picosecond Pulses ◽  
Dielectric Coatings ◽  
Laser Induced Damage ◽  
Extrinsic Defects ◽  
Multilayer Dielectric

Laser-induced damage in pellicles at 193 nm

1993 ◽  
Vol 32 (10) ◽  
pp. 2421 ◽  
Author(s):  
Mordechai Rothschild
Keyword(s):  
Laser Induced Damage ◽  
193 Nm

Effects of Process Parameters on the Optical Constants of Highly Textured V2O5Thin Films

2014 ◽  
Vol 117 (3) ◽  
pp. 438-442
Author(s):  
V. V. Atuchin ◽  
V. A. Kochubey ◽  
L. D. Pokrovsky ◽  
V. N. Kruchinin ◽  
C. V. Ramana
Keyword(s):  
Process Parameters ◽  
Optical Constants

Laser-induced damage of F-SiO2 protected fluoride-based AR coatings on subsurface-damage-free CaF2 at 193 nm

2016 ◽  
Author(s):  
Jue Wang ◽  
Gerald P. Cox ◽  
Michael J. D'Lallo ◽  
Steven Vankerkhove ◽  
Jean Francois Oudard
Keyword(s):  
Subsurface Damage ◽  
Laser Induced Damage ◽  
193 Nm

Laser-induced damage in pellicles at 193 nm

1992 ◽  
Author(s):  
Mordechai Rothschild ◽  
Jan H. C. Sedlacek
Keyword(s):  
Laser Induced Damage ◽  
193 Nm

Effects of process parameters on the optical constants of highly textured V2O5 thin films

2014 ◽  
Vol 117 (3) ◽  
pp. 423-427 ◽  
Author(s):  
V. V. Atuchin ◽  
V. A. Kochubey ◽  
L. D. Pokrovsky ◽  
V. N. Kruchinin ◽  
C. V. Ramana
Keyword(s):  
Thin Films ◽  
Process Parameters ◽  
Optical Constants ◽  
V2o5 Thin Films
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