Laser-induced damage thresholds and optical constants of ion-plated and ion-beam-sputtered Al 2 O 3 and HfO 2 coatings for the ultraviolet

1990 ◽  
Author(s):  
Alexandra Starke ◽  
Harald Schink ◽  
Jurgen Kolbe ◽  
Johanes Ebert
Keyword(s):  
Optical Constants ◽  
Ion Beam ◽  
Laser Induced Damage

scholarly journals Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold

2021 ◽  
Vol 17 (1) ◽  
Author(s):  
Zoltán Balogh-Michels ◽  
Igor Stevanovic ◽  
Aurelio Borzi ◽  
Andreas Bächli ◽  
Daniel Schachtler ◽  
...  
Keyword(s):  
Activation Energy ◽  
Crystallization Process ◽  
Ion Beam ◽  
Damage Threshold ◽  
High Activation ◽  
Quarter Wave ◽  
Dimensional Growth ◽  
Laser Induced Damage ◽  
Significant Increment

AbstractIn this work, we present our results about the thermal crystallization of ion beam sputtered hafnia on 0001 SiO2 substrates and its effect on the laser-induced damage threshold (LIDT). The crystallization process was studied using in-situ X-ray diffractometry. We determined an activation energy for crystallization of 2.6 ± 0.5 eV. It was found that the growth of the crystallites follows a two-dimensional growth mode. This, in combination with the high activation energy, leads to an apparent layer thickness-dependent crystallization temperature. LIDT measurements @355 nm on thermally treated 3 quarter-wave thick hafnia layers show a decrement of the 0% LIDT for 1 h @773 K treatment. Thermal treatment for 5 h leads to a significant increment of the LIDT values.

scholarly journals Investigation of laser-induced damage threshold improvement mechanism during ion beam sputtering of fused silica

2017 ◽  
Vol 25 (23) ◽  
pp. 29260 ◽  
Author(s):  
Mingjin Xu ◽  
Feng Shi ◽  
Lin Zhou ◽  
Yifan Dai ◽  
Xiaoqiang Peng ◽  
...  
Keyword(s):  
Ion Beam ◽  
Damage Threshold ◽  
Fused Silica ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Laser Induced Damage

Raman microprobe studies of laser induced damage in dielectric films

1991 ◽  
Vol 6 (1) ◽  
pp. 126-133 ◽  
Author(s):  
P.L. White ◽  
G.J. Exarhos ◽  
M. Bowden ◽  
N.M. Dixon ◽  
D.J. Gardiner
Keyword(s):  
Ion Beam ◽  
Rapid Quenching ◽  
Electron Beam Evaporation ◽  
Dielectric Films ◽  
Second Phase ◽  
Ion Beam Sputtering ◽  
Coating Materials ◽  
Electron Stream ◽  
Raman Microprobe ◽  
Laser Induced Damage

Raman microprobe studies of pulsed laser damaged TiO2 films deposited using three different methods are reported. Phase transformation and redeposition of coating materials were observed in selected regions of amorphous films deposited by ion beam sputtering and electron beam evaporation. Preferential removal of a specific phase or transformation to a second phase were observed in reactively sputtered films. Some damage sites exhibited regions of stress heterogeneity which can be explained in terms of the return electron stream model of plasma/target interaction and rapid quenching.

Laser-induced damage of rugate and quarter-wave stacks high reflectors deposited by ion-beam sputtering

2013 ◽  
Vol 52 (8) ◽  
pp. 086103 ◽  
Author(s):  
Zhao Qiao ◽  
Ping Ma ◽  
Hao Liu ◽  
Yunti Pu ◽  
Zhichao Liu
Keyword(s):  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Quarter Wave ◽  
Laser Induced Damage

Laser-induced damage thresholds of ion beam sputtered and magnetron sputtered AR-coatings on lithium borate

2005 ◽  
Author(s):  
A. Melninkaitis ◽  
D. Miksys ◽  
R. Grigonis ◽  
V. Sirutkaitis ◽  
D. Tumosa ◽  
...  
Keyword(s):  
Ion Beam ◽  
Lithium Borate ◽  
Laser Induced Damage
Sign in / Sign up

Export Citation Format

Share Document