Laser-induced damage of F-SiO2 protected fluoride-based AR coatings on subsurface-damage-free CaF2 at 193 nm

2016 ◽  
Author(s):  
Jue Wang ◽  
Gerald P. Cox ◽  
Michael J. D'Lallo ◽  
Steven Vankerkhove ◽  
Jean Francois Oudard
Keyword(s):  
Subsurface Damage ◽  
Laser Induced Damage ◽  
193 Nm

Laser-induced damage in pellicles at 193 nm

1993 ◽  
Vol 32 (10) ◽  
pp. 2421 ◽  
Author(s):  
Mordechai Rothschild
Keyword(s):  
Laser Induced Damage ◽  
193 Nm

Laser-induced damage in pellicles at 193 nm

1992 ◽  
Author(s):  
Mordechai Rothschild ◽  
Jan H. C. Sedlacek
Keyword(s):  
Laser Induced Damage ◽  
193 Nm

Investigation of subsurface damage density and morphology impact on the laser-induced damage threshold of fused silica

2019 ◽  
Vol 58 (36) ◽  
pp. 9839 ◽  
Author(s):  
Hongxiang Wang ◽  
Chu Wang ◽  
Mingzhuang Zhang ◽  
Ermeng Zheng ◽  
Jing Hou ◽  
...  
Keyword(s):  
Damage Threshold ◽  
Fused Silica ◽  
Subsurface Damage ◽  
Laser Induced Damage

Critical issues on the assessment of laser-induced damage thresholds of fluoride multilayer coatings at 193 nm

2000 ◽  
Author(s):  
Roland Thielsch ◽  
Joerg Heber ◽  
Norbert Kaiser ◽  
Sven Martin ◽  
Eberhard Welsch
Keyword(s):  
Multilayer Coatings ◽  
Critical Issues ◽  
Laser Induced Damage ◽  
193 Nm

The Assessment of Subsurface Damage in Ground Optics by Chemical Etching

2016 ◽  
Vol 679 ◽  
pp. 149-153
Author(s):  
Hui Ye ◽  
Wei Yang
Keyword(s):  
Chemical Etching ◽  
Damage Threshold ◽  
Subsurface Damage ◽  
Polishing Process ◽  
Etching Technique ◽  
Optical Elements ◽  
The Past ◽  
Laser Induced Damage ◽  
Grinding And Polishing

Optical subsurface damage (SSD), generated from traditional grinding and polishing process, is prone to lower the laser-induced damage threshold (LIDT) of optical elements. Due to the fact that SSD elimination is on the premise of SSD evaluation, numerous SSD characterizing techniques have been proposed in the past few decades. In this paper, various SSD evaluations based on chemical etching technique are described and compared.

Laser Induced Damage of Fluoride Coatings at 193 nm

2013 ◽  
Vol 40 (7) ◽  
pp. 0707001 ◽  
Author(s):  
常艳贺 Chang Yanhe ◽  
金春水 Jin Chunshui ◽  
李春 Li Chun ◽  
靳京城 Jin Jingcheng
Keyword(s):  
Laser Induced Damage ◽  
193 Nm

scholarly journals Quantitative Evaluation of Subsurface Damage by Improved Total Internal Reflection Microscopy

2019 ◽  
Vol 9 (9) ◽  
pp. 1819 ◽  
Author(s):  
Kaizao Ni ◽  
Xin Cheng ◽  
Baoming Huang ◽  
Shijie Liu ◽  
Jianda Shao ◽  
...  
Keyword(s):  
Total Internal Reflection ◽  
Damage Threshold ◽  
Fused Silica ◽  
Subsurface Damage ◽  
Internal Reflection ◽  
Depth Of Field ◽  
Small Depth ◽  
Total Internal Reflection Microscopy ◽  
Laser Induced Damage ◽  
Definition Of

Subsurface damage (SSD), having a great impact on the laser-induced damage threshold (LIDT) of ultra-smooth optics applied in high-power laser systems, should be tightly controlled. An improved total internal reflection microscopy (TIRM), combined with digital image processing techniques, is proposed to quantitatively inspect SSD. With the characteristic that there is a relatively small depth of field (DOF) for a microscope at high magnification (50×), a series of SSD images are captured along with the microscope focusing at different depths under the surface by means of micro-focusing control. The definition of each image is calculated through wavelet transformation. By simulation, the relationship between the definition of TIRM images and the depth of the SSD has been established. According to the definition curve, the SSD depth is acquired. Fused silica glasses polished after fine grinding are measured non-destructively by our TIRM setup. The results show that the improved TIRM is a useful method to evaluate SSD. It is helpful to improve the efficiency of optical fabrication.

UHV-TEM studies of laser-induced damage

1991 ◽  
Vol 49 ◽  
pp. 632-633
Author(s):  
T.S. Savage ◽  
R. Ai ◽  
D. Dunn ◽  
L.D. Marks
Keyword(s):  
Surface Science ◽  
Rapid Heating ◽  
Local Heating ◽  
Routine Practice ◽  
Transmission Electron ◽  
Northwestern University ◽  
Laser Induced Damage ◽  
Set Up ◽  
Focusing Lens ◽  
Diffusion Of Impurities

The use of lasers for surface annealing, heating and/or damage has become a routine practice in the study of materials. Lasers have been closely looked at as an annealing technique for silicon and other semiconductors. They allow for local heating from a beam which can be focused and tuned to different wavelengths for specific tasks. Pulsed dye lasers allow for short, quick bursts which can allow the sample to be rapidly heated and quenched. This short, rapid heating period may be important for cases where diffusion of impurities or dopants may not be desirable.At Northwestern University, a Candela SLL - 250 pulsed dye laser, with a maximum power of 1 Joule/pulse over 350 - 400 nanoseconds, has been set up in conjunction with a Hitachi UHV-H9000 transmission electron microscope. The laser beam is introduced into the surface science chamber through a series of mirrors, a focusing lens and a six inch quartz window.

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