Line edge roughness measurement through SEM images: effects of image digitization and their mitigation

33rd European Mask and Lithography Conference ◽

10.1117/12.2294060 ◽

2017 ◽

Cited By ~ 4

Author(s):

George Papavieros ◽

Vassilios Constantoudis

Keyword(s):

Line Edge Roughness ◽

Roughness Measurement ◽

Sem Images ◽

Edge Roughness ◽

Image Digitization

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An atomic force microscopy-based method for line edge roughness measurement

Journal of Applied Physics ◽

10.1063/1.4794368 ◽

2013 ◽

Vol 113 (10) ◽

pp. 104903 ◽

Cited By ~ 24

Author(s):

M. Fouchier ◽

E. Pargon ◽

B. Bardet

Keyword(s):

Atomic Force Microscopy ◽

Line Edge Roughness ◽

Roughness Measurement ◽

Force Microscopy ◽

Atomic Force ◽

Edge Roughness

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Root-cause decomposition of line edge roughness and its application to cross-section profile prediction using top-view SEM images

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4827187 ◽

2013 ◽

Vol 31 (6) ◽

pp. 06F802

Author(s):

Hiroshi Fukuda

Keyword(s):

Cross Section ◽

Line Edge Roughness ◽

Sem Images ◽

Root Cause ◽

Edge Roughness ◽

Section Profile ◽

Cross Section Profile ◽

Top View

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Global minimization line-edge roughness analysis of top down SEM images

10.1117/12.2258035 ◽

2017 ◽

Cited By ~ 3

Author(s):

Barton Lane ◽

Chris Mack ◽

Nasim Eibagi ◽

Peter Ventzek

Keyword(s):

Global Minimization ◽

Line Edge Roughness ◽

Top Down ◽

Sem Images ◽

Edge Roughness ◽

Roughness Analysis

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Practical approach to modeling e-beam lithographic process from SEM images for minimization of line edge roughness and critical dimension error

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4937740 ◽

2016 ◽

Vol 34 (1) ◽

pp. 011601 ◽

Cited By ~ 3

Author(s):

Rui Guo ◽

Soo-Young Lee ◽

Jin Choi ◽

Sung-Hoon Park ◽

In-Kyun Shin ◽

...

Keyword(s):

Critical Dimension ◽

Practical Approach ◽

Line Edge Roughness ◽

Sem Images ◽

Edge Roughness

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Feature-shape and line-edge roughness measurement of deep submicron lithographic structures using small-angle neutron scattering

10.1117/12.436767 ◽

2001 ◽

Cited By ~ 1

Author(s):

Eric K. Lin ◽

Wen-li Wu ◽

Qinghuang Lin ◽

Marie Angelopoulos

Keyword(s):

Neutron Scattering ◽

Small Angle ◽

Small Angle Neutron Scattering ◽

Deep Submicron ◽

Line Edge Roughness ◽

Roughness Measurement ◽

Edge Roughness

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Effect of tip shape on line edge roughness measurement based on atomic force microscopy

Review of Scientific Instruments ◽

10.1063/1.3518973 ◽

2010 ◽

Vol 81 (12) ◽

pp. 123703 ◽

Cited By ~ 3

Author(s):

Ning Li ◽

Fei Wang ◽

Xuezeng Zhao

Keyword(s):

Atomic Force Microscopy ◽

Line Edge Roughness ◽

Roughness Measurement ◽

Force Microscopy ◽

Atomic Force ◽

Edge Roughness ◽

On Line

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Cross-sectional profile prediction from top-view SEM images based on root-cause decomposition of line-edge roughness

10.1117/12.2045457 ◽

2014 ◽

Author(s):

Hiroshi Fukuda

Keyword(s):

Line Edge Roughness ◽

Sem Images ◽

Cross Sectional ◽

Root Cause ◽

Edge Roughness ◽

Cross Sectional Profile ◽

Sectional Profile ◽

Top View

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Denoising line edge roughness measurement using hidden Markov models

Metrology, Inspection, and Process Control for Microlithography XXXIII ◽

10.1117/12.2523422 ◽

2019 ◽

Author(s):

George Papavieros ◽

Ioannis Kontoyiannis ◽

Vassilios Constantoudis ◽

Evangelos Gogolides

Keyword(s):

Hidden Markov Models ◽

Markov Models ◽

Hidden Markov ◽

Line Edge Roughness ◽

Roughness Measurement ◽

Edge Roughness

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Line edge roughness measurement on vertical sidewall for reference metrology using a metrological tilting atomic force microscope

Journal of Micro/Nanolithography MEMS and MOEMS ◽

10.1117/1.jmm.19.1.014003 ◽

2020 ◽

Vol 19 (01) ◽

pp. 1

Author(s):

Ryosuke Kizu ◽

Ichiko Misumi ◽

Akiko Hirai ◽

Satoshi Gonda

Keyword(s):

Atomic Force Microscope ◽

Line Edge Roughness ◽

Roughness Measurement ◽

Vertical Sidewall ◽

Atomic Force ◽

Edge Roughness

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Noise filtering for accurate measurement of line edge roughness and critical dimension from SEM images

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4968184 ◽

2016 ◽

Vol 34 (6) ◽

pp. 06K604 ◽

Cited By ~ 1

Author(s):

Dehua Li ◽

Rui Guo ◽

Soo-Young Lee ◽

Jin Choi ◽

Seom-Beom Kim ◽

...

Keyword(s):

Critical Dimension ◽

Noise Filtering ◽

Line Edge Roughness ◽

Sem Images ◽

Edge Roughness

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