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Global minimization line-edge roughness analysis of top down SEM images
Mapping Intimacies
◽
10.1117/12.2258035
◽
2017
◽
Cited By ~ 3
Author(s):
Barton Lane
◽
Chris Mack
◽
Nasim Eibagi
◽
Peter Ventzek
Keyword(s):
Global Minimization
◽
Line Edge Roughness
◽
Top Down
◽
Sem Images
◽
Edge Roughness
◽
Roughness Analysis
Download Full-text
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Cited By
References
Root-cause decomposition of line edge roughness and its application to cross-section profile prediction using top-view SEM images
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
◽
10.1116/1.4827187
◽
2013
◽
Vol 31
(6)
◽
pp. 06F802
Author(s):
Hiroshi Fukuda
Keyword(s):
Cross Section
◽
Line Edge Roughness
◽
Sem Images
◽
Root Cause
◽
Edge Roughness
◽
Section Profile
◽
Cross Section Profile
◽
Top View
Download Full-text
Practical approach to modeling e-beam lithographic process from SEM images for minimization of line edge roughness and critical dimension error
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
◽
10.1116/1.4937740
◽
2016
◽
Vol 34
(1)
◽
pp. 011601
◽
Cited By ~ 3
Author(s):
Rui Guo
◽
Soo-Young Lee
◽
Jin Choi
◽
Sung-Hoon Park
◽
In-Kyun Shin
◽
...
Keyword(s):
Critical Dimension
◽
Practical Approach
◽
Line Edge Roughness
◽
Sem Images
◽
Edge Roughness
Download Full-text
Determination of line edge roughness in low-dose top-down scanning electron microscopy images
Journal of Micro/Nanolithography MEMS and MOEMS
◽
10.1117/1.jmm.13.3.033009
◽
2014
◽
Vol 13
(3)
◽
pp. 033009
◽
Cited By ~ 23
Author(s):
Thomas Verduin
◽
Pieter Kruit
◽
Cornelis W. Hagen
Keyword(s):
Electron Microscopy
◽
Scanning Electron Microscopy
◽
Low Dose
◽
Line Edge Roughness
◽
Top Down
◽
Edge Roughness
◽
Microscopy Images
◽
Scanning Electron
Download Full-text
Cross-sectional profile prediction from top-view SEM images based on root-cause decomposition of line-edge roughness
10.1117/12.2045457
◽
2014
◽
Author(s):
Hiroshi Fukuda
Keyword(s):
Line Edge Roughness
◽
Sem Images
◽
Cross Sectional
◽
Root Cause
◽
Edge Roughness
◽
Cross Sectional Profile
◽
Sectional Profile
◽
Top View
Download Full-text
Photoresist line-edge roughness analysis using scaling concepts
Journal of Micro/Nanolithography MEMS and MOEMS
◽
10.1117/1.1759325
◽
2004
◽
Vol 3
(3)
◽
pp. 429
◽
Cited By ~ 24
Author(s):
Vassilios Constantoudis
Keyword(s):
Line Edge Roughness
◽
Edge Roughness
◽
Roughness Analysis
Download Full-text
Photoresist line-edge roughness analysis using scaling concepts
10.1117/12.482809
◽
2003
◽
Cited By ~ 9
Author(s):
Vasilios Constantoudis
◽
George P. Patsis
◽
Evangelos Gogolides
Keyword(s):
Line Edge Roughness
◽
Edge Roughness
◽
Roughness Analysis
Download Full-text
Noise filtering for accurate measurement of line edge roughness and critical dimension from SEM images
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
◽
10.1116/1.4968184
◽
2016
◽
Vol 34
(6)
◽
pp. 06K604
◽
Cited By ~ 1
Author(s):
Dehua Li
◽
Rui Guo
◽
Soo-Young Lee
◽
Jin Choi
◽
Seom-Beom Kim
◽
...
Keyword(s):
Critical Dimension
◽
Noise Filtering
◽
Line Edge Roughness
◽
Sem Images
◽
Edge Roughness
Download Full-text
Line-edge roughness estimation in SEM images of lithographic nanostructures
Acta Crystallographica Section A Foundations of Crystallography
◽
10.1107/s0108767312095281
◽
2012
◽
Vol 68
(a1)
◽
pp. s243-s243
Author(s):
K. Bojar
Keyword(s):
Line Edge Roughness
◽
Sem Images
◽
Edge Roughness
Download Full-text
The effect of sidewall roughness on line edge roughness in top-down scanning electron microscopy images
10.1117/12.2085768
◽
2015
◽
Cited By ~ 1
Author(s):
T. Verduin
◽
S. R. Lokhorst
◽
P. Kruit
◽
C. W. Hagen
Keyword(s):
Electron Microscopy
◽
Scanning Electron Microscopy
◽
Line Edge Roughness
◽
Top Down
◽
Sidewall Roughness
◽
Edge Roughness
◽
On Line
◽
Microscopy Images
◽
Scanning Electron
Download Full-text
Line edge roughness measurement through SEM images: effects of image digitization and their mitigation
33rd European Mask and Lithography Conference
◽
10.1117/12.2294060
◽
2017
◽
Cited By ~ 4
Author(s):
George Papavieros
◽
Vassilios Constantoudis
Keyword(s):
Line Edge Roughness
◽
Roughness Measurement
◽
Sem Images
◽
Edge Roughness
◽
Image Digitization
Download Full-text
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