Optical studies of fluorocarbon film formation by a high-density plasma etcher

1995 ◽  
Author(s):  
Ronald A. Carpio ◽  
Burt W. Fowler ◽  
Thien T. Nguyen
Keyword(s):  
Film Formation ◽  
High Density ◽  
Optical Studies ◽  
Fluorocarbon Film ◽  
Density Plasma

High-Density Plasma Etching of Low Dielectric Constant Materials

1998 ◽  
Vol 511 ◽  
Author(s):  
T. E. F. M. Standaert ◽  
P. J. Matsuo ◽  
S. D. Allen ◽  
G. S. Oehrlein ◽  
T. J. Dalton ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
High Density ◽  
Low Dielectric Constant ◽  
Hydrogen Silsesquioxane ◽  
Copper Surfaces ◽  
Low Dielectric ◽  
Oxygen Contamination ◽  
Low Dielectric Constant Materials ◽  
Fluorocarbon Film ◽  
Density Plasma

ABSTRACTThe patterning of several novel low dielectric constant (K) materials has been studied in a high-density plasma (HDP) tool. Recent results obtained on oxide-like materials, such as fluorinated oxide, hydrogen silsesquioxane (HSQ), and methyl silsesquioxane (MSQ), are reviewed. These materials can be successfully patterned using a fluorocarbon etching chemistry. The etching is in this case controlled by a thin fluorocarbon film at the surface. The patterning of polymer dielectrics can be performed in an oxygen etching chemistry. As an example, the patterning of Parylene-N in an oxygen chemistry is discussed. In this case, the ion and the oxygen radical flux need to be properly controlled to obtain a directional etching process. After the dielectric etch, either in a fluorocarbon or oxygen based chemistry, fluorocarbons and oxygen contamination remain at the exposed metal surfaces. We recently demonstrated how a plasma treatment following the dielectric etch reduces these contaminants. The results of this treatment on copper surfaces and the resulting modification to the dielectric are reviewed.

High quality gate insulator film formation on SiC using by microwave-excited high-density plasma

2007 ◽  
Vol 47 (4-5) ◽  
pp. 786-789
Author(s):  
Koutarou Tanaka ◽  
Hiroaki Tanaka ◽  
Akinobu Teramoto ◽  
Shigetoshi Sugawa ◽  
Tadahiro Ohmi
Keyword(s):  
Film Formation ◽  
High Density ◽  
Gate Insulator ◽  
High Quality ◽  
Insulator Film ◽  
Density Plasma

Control of high-density plasma sources for CVD and etching

Vacuum ◽  
1997 ◽  
Vol 48 (7-9) ◽  
pp. 659-664 ◽  
Author(s):  
K Suzuki ◽  
H Sugai ◽  
K Nakamura ◽  
TH Ahn ◽  
M Nagatsu
Keyword(s):  
High Density ◽  
Plasma Sources ◽  
Density Plasma

scholarly journals Studies on laser-driven generation of fast high-density plasma blocks for fast ignition

2006 ◽  
Vol 24 (2) ◽  
pp. 249-254 ◽  
Author(s):  
J. BADZIAK ◽  
S. GŁOWACZ ◽  
H. HORA ◽  
S. JABŁOŃSKI ◽  
J. WOŁOWSKI
Keyword(s):  
Proton Beam ◽  
Laser Energy ◽  
Skin Layer ◽  
Fast Ignition ◽  
High Density ◽  
Proton Density ◽  
Fast Ignitor ◽  
Ignition Threshold ◽  
Density Plasma

The properties of plasma (proton) block driven by the laser-induced skin-layer ponderomotive acceleration (S-LPA) mechanism are discussed. It is shown that the proton density of the plasma block is about a thousand times higher than that of the proton beam produced by the target normal sheath acceleration (TNSA) mechanism. Such a high-density plasma (proton) block can be considered as a fast ignitor of fusion targets. The estimates show that using the S-LPA driven plasma block, the ignition threshold for precompressed DT fuel can be reached at the ps laser energy ≤ 100 kJ.

Characterization of the CH4/H2/Ar high density plasma etching process for HgCdTe

1999 ◽  
Vol 28 (4) ◽  
pp. 347-354 ◽  
Author(s):  
C. R. Eddy ◽  
D. Leonhardt ◽  
V. A. Shamamian ◽  
J. R. Meyer ◽  
C. A. Hoffman ◽  
...  
Keyword(s):  
Plasma Etching ◽  
High Density ◽  
Etching Process ◽  
Plasma Etching Process ◽  
Density Plasma

High density plasma processing of nanostructured diamond films on metals

1998 ◽  
Vol 84 (11) ◽  
pp. 6469-6471 ◽  
Author(s):  
Shane A. Catledge ◽  
Yogesh K. Vohra
Keyword(s):  
Diamond Films ◽  
Plasma Processing ◽  
High Density ◽  
Density Plasma

scholarly journals On the entry and transit of high-density plasma across the polar cap

2010 ◽  
Vol 115 (A12) ◽  
pp. n/a-n/a ◽  
Author(s):  
K. Oksavik ◽  
V. L. Barth ◽  
J. Moen ◽  
M. Lester
Keyword(s):  
High Density ◽  
Polar Cap ◽  
Density Plasma
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