High density plasma processing of nanostructured diamond films on metals

1998 ◽  
Vol 84 (11) ◽  
pp. 6469-6471 ◽  
Author(s):  
Shane A. Catledge ◽  
Yogesh K. Vohra
Keyword(s):  
Diamond Films ◽  
Plasma Processing ◽  
High Density ◽  
Density Plasma

Hydrogenation effects during high-density plasma processing of GaAs MESFETS

1997 ◽  
Vol 12 (9) ◽  
pp. 1154-1160 ◽  
Author(s):  
F Ren ◽  
J W Lee ◽  
C R Abernathy ◽  
S J Pearton ◽  
R J Shul ◽  
...  
Keyword(s):  
Plasma Processing ◽  
High Density ◽  
Density Plasma

Effects of high-density plasma processing on MOSFET matching, noise, and hot carrier reliability

1999 ◽  
Author(s):  
Sidhartha Sen ◽  
Edward B. Harris ◽  
Richard W. Gregor ◽  
Samuel Martin ◽  
Mahjoub A. Abdelgadir ◽  
...  
Keyword(s):  
Plasma Processing ◽  
High Density ◽  
Hot Carrier ◽  
Density Plasma

Nitrogen-Induced Nanocrystallinity of CVD Diamond Films on Ti-6Al-4V Alloys

1998 ◽  
Vol 555 ◽  
Author(s):  
Shane A. Catledge ◽  
Yogesh K. Vohra
Keyword(s):  
Microwave Plasma ◽  
Grazing Angle ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Nanocrystalline Structure ◽  
Optical Emission ◽  
High Density ◽  
Operating Pressure ◽  
Plasma Chemical Vapor Deposition ◽  
Density Plasma

AbstractMicrowave plasma chemical vapor deposition (CVD) was used to grow nanocrystalline diamond films by adding nitrogen to a high density plasma defined by a high operating pressure (125 Torr) and high methane feedgas concentration (15% in a balance of hydrogen). Films grown at these conditions but without nitrogen exhibited well-faceted, high phase purity crystalline diamond while those grown with added nitrogen showed a nanocrystalline structure and were an order of magnitude smoother. The nitrogen-induced nanocrystalline films are believed to be comprised predominantly of diamond nanocrystallites in a matrix of tetrahedral amorphous carbon. The films were characterized by Raman spectroscopy, grazing-angle x-ray diffraction, surface profilometry, nano-indentation, electron microscopy, and pin-on-disc tribometry. In contrast to standard CVD conditions, the high density plasma results in adhered films on Ti-6AI-4V substrates even at substrate temperatures of 850°C. We present plasma optical emission spectroscopy results which are correlated with changes in the Raman spectra and the film microstructure. The hardness of the films (∼90 GPa), their low rms surface roughness (27 nm), and their good adhesion to the substrate makes these films potentially useful for tribological applications.

High density plasma processing of p-Hg0.7Cd0.3Te

2006 ◽  
Author(s):  
Benjamin Park ◽  
Charles Musca ◽  
Jarek Antoszewski ◽  
John Dell ◽  
Lorenzo Faraone
Keyword(s):  
Plasma Processing ◽  
High Density ◽  
Density Plasma
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