Characterization of molybdenum/silicon multilayers deposited by ion beam sputtering and rf magnetron sputtering

1993 ◽  
Author(s):  
Katsuhiko Murakami ◽  
Hiroshi Nakamura ◽  
Tetsuya Oshino ◽  
Masayuki Ohtani ◽  
Hiroshi Nagata
Keyword(s):  
Magnetron Sputtering ◽  
Ion Beam ◽  
Rf Magnetron Sputtering ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Characterization of carbon nitride thin films prepared by dual ion beam sputtering

1996 ◽  
Vol 69 (6) ◽  
pp. 764-766 ◽  
Author(s):  
A. Fernández ◽  
P. Prieto ◽  
C. Quirós ◽  
J. M. Sanz ◽  
J.‐M. Martin ◽  
...  
Keyword(s):  
Thin Films ◽  
Carbon Nitride ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Characterization of Si-N films prepared by reactive ion beam sputtering

1982 ◽  
Vol 11 (3) ◽  
pp. 491-504 ◽  
Author(s):  
M. D. Aggarwal ◽  
S. Ashok ◽  
S. J. Fonash
Keyword(s):  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

The significance of in situ conditions in the characterization of GaSb nanopatterned surfaces via ion beam sputtering

2011 ◽  
Vol 110 (7) ◽  
pp. 074301 ◽  
Author(s):  
Osman El-Atwani ◽  
J. P. Allain ◽  
Alex Cimaroli ◽  
Anastassiya Suslova ◽  
Sami Ortoleva
Keyword(s):  
Ion Beam ◽  
Ion Beam Sputtering ◽  
In Situ Conditions ◽  
Beam Sputtering
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