scholarly journals Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2

2022 ◽  
Vol 40 (1) ◽  
pp. 013001
Author(s):  
Youngseok Lee ◽  
Inho Seong ◽  
Jangjae Lee ◽  
Sangho Lee ◽  
Chulhee Cho ◽  
...  
Keyword(s):  
Film Deposition ◽  
Sample Thickness ◽  
Fluorocarbon Film

Plasma chemistry in fluorocarbon film deposition from pentafluoroethane/argon mixtures

1999 ◽  
Vol 17 (6) ◽  
pp. 3265-3271 ◽  
Author(s):  
Sairam Agraharam ◽  
Dennis W. Hess ◽  
Paul A. Kohl ◽  
Sue A. Bidstrup Allen
Keyword(s):  
Plasma Chemistry ◽  
Film Deposition ◽  
Fluorocarbon Film

Atomic layer etching of SiO2 by alternating an O2 plasma with fluorocarbon film deposition

2017 ◽  
Vol 35 (1) ◽  
pp. 01A103 ◽  
Author(s):  
Takayoshi Tsutsumi ◽  
Hiroki Kondo ◽  
Masaru Hori ◽  
Masaru Zaitsu ◽  
Akiko Kobayashi ◽  
...  
Keyword(s):  
Atomic Layer ◽  
Film Deposition ◽  
Atomic Layer Etching ◽  
O2 Plasma ◽  
Fluorocarbon Film

Comparison of fluorocarbon film deposition by pulsed/continuous wave and downstream radio frequency plasmas

Vacuum ◽  
2010 ◽  
Vol 85 (2) ◽  
pp. 253-262 ◽  
Author(s):  
Dongping Liu ◽  
Jiandong Gu ◽  
Zhiqing Feng ◽  
Dongming Li ◽  
Jinhai Niu ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Continuous Wave ◽  
Film Deposition ◽  
Fluorocarbon Film

Characterization of Sputtered Films using the Scanning Electron Microscope

1973 ◽  
Vol 31 ◽  
pp. 44-45
Author(s):  
R. F. Schneidmiller ◽  
W. F. Thrower ◽  
C. Ang
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Sputtered Films ◽  
Plasma Sputtering ◽  
Microelectronic Devices ◽  
Control Film ◽  
Scanning Electron

Solid state materials in the form of thin films have found increasing structural and electronic applications. Among the multitude of thin film deposition techniques, the radio frequency induced plasma sputtering has gained considerable utilization in recent years through advances in equipment design and process improvement, as well as the discovery of the versatility of the process to control film properties. In our laboratory we have used the scanning electron microscope extensively in the direct and indirect characterization of sputtered films for correlation with their physical and electrical properties.Scanning electron microscopy is a powerful tool for the examination of surfaces of solids and for the failure analysis of structural components and microelectronic devices.

SEM evaluation of the TEM cold-stage double-film specimen

1984 ◽  
Vol 42 ◽  
pp. 272-273
Author(s):  
Jayesh Bellare
Keyword(s):  
Spatial Distribution ◽  
Sample Preparation ◽  
Sample Thickness ◽  
Specimen Preparation ◽  
Preparation Technique ◽  
Liquid Sample ◽  
Thin Specimen ◽  
Sample Preparation Technique ◽  
Cold Stage ◽  
Film Specimen

Seeing is believing, but only after the sample preparation technique has received a systematic study and a full record is made of the treatment the sample gets.For microstructured liquids and suspensions, fast-freeze thermal fixation and cold-stage microscopy is perhaps the least artifact-laden technique. In the double-film specimen preparation technique, a layer of liquid sample is trapped between 100- and 400-mesh polymer (polyimide, PI) coated grids. Blotting against filter paper drains excess liquid and provides a thin specimen, which is fast-frozen by plunging into liquid nitrogen. This frozen sandwich (Fig. 1) is mounted in a cooling holder and viewed in TEM.Though extremely promising for visualization of liquid microstructures, this double-film technique suffers from a) ireproducibility and nonuniformity of sample thickness, b) low yield of imageable grid squares and c) nonuniform spatial distribution of particulates, which results in fewer being imaged.

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