Studies of fluorocarbon film deposition and its correlation with etched trench sidewall angle by employing a gap structure using C[sub 4]F[sub 8]∕Ar and CF[sub 4]∕H[sub 2] based capacitively coupled plasmas

2008 ◽  
Vol 26 (1) ◽  
pp. 11 ◽  
Author(s):  
Li Ling ◽  
X. Hua ◽  
L. Zheng ◽  
G. S. Oehrlein ◽  
E. A. Hudson ◽  
...  
Keyword(s):  
Film Deposition ◽  
Capacitively Coupled ◽  
Sidewall Angle ◽  
Coupled Plasmas ◽  
Fluorocarbon Film ◽  
Gap Structure

Thin Film Deposition in Capacitively Coupled Plasmas Fed with Bis(dimethylamino)dimethylsilane and Oxygen: An FTIR study

2009 ◽  
Vol 6 (8) ◽  
pp. 506-511 ◽  
Author(s):  
Rosa Di Mundo ◽  
Fabio Palumbo ◽  
Francesco Fracassi ◽  
Riccardo d'Agostino
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Capacitively Coupled ◽  
Ftir Study ◽  
Coupled Plasmas

Plasma chemistry in fluorocarbon film deposition from pentafluoroethane/argon mixtures

1999 ◽  
Vol 17 (6) ◽  
pp. 3265-3271 ◽  
Author(s):  
Sairam Agraharam ◽  
Dennis W. Hess ◽  
Paul A. Kohl ◽  
Sue A. Bidstrup Allen
Keyword(s):  
Plasma Chemistry ◽  
Film Deposition ◽  
Fluorocarbon Film

An overview of diagnostic methods of low-pressure capacitively coupled plasmas

2012 ◽  
Vol 521 ◽  
pp. 141-145 ◽  
Author(s):  
Yong-Xin Liu ◽  
Wei Jiang ◽  
Xiao-Song Li ◽  
Wen-Qi Lu ◽  
You-Nian Wang
Keyword(s):  
Low Pressure ◽  
Diagnostic Methods ◽  
Capacitively Coupled ◽  
Coupled Plasmas

Impact of phase lag on uniformity in pulsed capacitively coupled plasmas

2011 ◽  
Vol 99 (2) ◽  
pp. 021501 ◽  
Author(s):  
Ankur Agarwal ◽  
Shahid Rauf ◽  
Ken Collins
Keyword(s):  
Phase Lag ◽  
Capacitively Coupled ◽  
Coupled Plasmas

Effects of magnetic field on the secondary electron asymmetry effect in capacitively coupled plasmas

2021 ◽  
Vol 28 (12) ◽  
pp. 123505
Author(s):  
Shali Yang ◽  
Tianxiang Zhang ◽  
Hanlei Lin ◽  
Hao Wu ◽  
Qiang Zhang
Keyword(s):  
Magnetic Field ◽  
Secondary Electron ◽  
Asymmetry Effect ◽  
Capacitively Coupled ◽  
Coupled Plasmas

Resonant sheath heating in weakly magnetized capacitively coupled plasmas due to electron-cyclotron motion

2021 ◽  
Vol 104 (4) ◽  
Author(s):  
Quan-Zhi Zhang ◽  
Jing-Yu Sun ◽  
Wen-Qi Lu ◽  
Julian Schulze ◽  
Yu-Qing Guo ◽  
...  
Keyword(s):  
Electron Cyclotron ◽  
Cyclotron Motion ◽  
Capacitively Coupled ◽  
Coupled Plasmas
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