Origin of area selective plasma enhanced chemical vapor deposition of microcrystalline silicon

Ghewa Akiki; Mathieu Frégnaux; Ileana Florea; Pavel Bulkin; Dmitri Daineka; Sergej Filonovich; Muriel Bouttemy; Erik V. Johnson

doi:10.1116/6.0000653

Origin of area selective plasma enhanced chemical vapor deposition of microcrystalline silicon

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/6.0000653 ◽

2021 ◽

Vol 39 (1) ◽

pp. 013201

Author(s):

Ghewa Akiki ◽

Mathieu Frégnaux ◽

Ileana Florea ◽

Pavel Bulkin ◽

Dmitri Daineka ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon

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Characterization of Microcrystalline Silicon Thin Film Solar Cells Prepared by High Working Pressure Plasma-enhanced Chemical Vapor Deposition

2017 IEEE 44th Photovoltaic Specialist Conference (PVSC) ◽

10.1109/pvsc.2017.8366297 ◽

2017 ◽

Author(s):

Jung-Dae Kwon ◽

Dong-Ho Kim ◽

Ji-Hoon Lee ◽

Myungkwan Song ◽

Myunghun Shin

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thin Film Solar Cells ◽

Microcrystalline Silicon ◽

Silicon Thin Film ◽

Working Pressure ◽

High Working Pressure

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Evolution of structure in thin microcrystalline silicon films grown by electron-cyclotron resonance chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1289783 ◽

2000 ◽

Vol 88 (7) ◽

pp. 4376 ◽

Cited By ~ 40

Author(s):

M. Birkholz ◽

B. Selle ◽

E. Conrad ◽

K. Lips ◽

W. Fuhs

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Silicon Films ◽

Microcrystalline Silicon ◽

Evolution Of Structure

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Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(99)00714-0 ◽

2000 ◽

Vol 266-269 ◽

pp. 31-37 ◽

Cited By ~ 162

Author(s):

P Roca i Cabarrocas

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Microcrystalline Silicon

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A study of optical properties of hydrogenated microcrystalline silicon films prepared by plasma enhanced chemical vapor deposition technique at different conditions of excited power and pressure

Vacuum ◽

10.1016/j.vacuum.2009.01.009 ◽

2009 ◽

Vol 83 (7) ◽

pp. 1023-1030 ◽

Cited By ~ 9

Author(s):

R.I. Badran ◽

F.S. Al-Hazmi ◽

S. Al-Heniti ◽

A.A. Al-Ghamdi ◽

J. Li ◽

...

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Deposition Technique ◽

Microcrystalline Silicon ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Hydrogen structures and the optoelectronic properties in transition films from amorphous to microcrystalline silicon prepared by hot-wire chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1555680 ◽

2003 ◽

Vol 93 (7) ◽

pp. 3776-3783 ◽

Cited By ~ 84

Author(s):

Daxing Han ◽

Keda Wang ◽

Jessica M. Owens ◽

Lynn Gedvilas ◽

Brent Nelson ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Optoelectronic Properties ◽

Hot Wire ◽

Microcrystalline Silicon

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The role of hydrogen dilution of silane and phosphorus doping on hydrogenated microcrystalline silicon (μc-Si:H) films prepared by hot-wire chemical vapor deposition (HW-CVD) technique

Thin Solid Films ◽

10.1016/s0040-6090(01)01269-x ◽

2001 ◽

Vol 395 (1-2) ◽

pp. 206-212 ◽

Cited By ~ 23

Author(s):

S.R Jadkar ◽

J.V Sali ◽

M.G Takwale ◽

D.V Musale ◽

S.T Kshirsagar

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Microcrystalline Silicon ◽

Phosphorus Doping ◽

Hydrogen Dilution

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A comparative study of the light-induced defects in intrinsic amorphous and microcrystalline silicon deposited by remote plasma enhanced chemical vapor deposition

10.1063/1.41030 ◽

1991 ◽

Cited By ~ 8

Author(s):

M. J. Williams ◽

Cheng Wang ◽

G. Lucovsky

Keyword(s):

Chemical Vapor Deposition ◽

Comparative Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Remote Plasma ◽

Induced Defects

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Structure of Microcrystalline Silicon Carbide Films Prepared by Hydrogen-Radical-Enhanced Chemical Vapor Deposition in Magnetic Field

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.4395 ◽

1994 ◽

Vol 33 (Part 1, No. 7B) ◽

pp. 4395-4399 ◽

Cited By ~ 5

Author(s):

Kanji Yasui ◽

Masayoshi Muramoto ◽

Tadashi Akahane

Keyword(s):

Magnetic Field ◽

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Hydrogen Radical

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Low Temperature Microcrystalline Silicon Solar Cells Prepared by Hot-Wire Chemical Vapor Deposition

2006 IEEE 4th World Conference on Photovoltaic Energy Conference ◽

10.1109/wcpec.2006.279800 ◽

2006 ◽

Cited By ~ 1

Author(s):

M.M. Adachi ◽

W.f.l. Tse ◽

K.S. Karim

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Solar Cells ◽

Hot Wire ◽

Microcrystalline Silicon

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Structure of amorphous and microcrystalline silicon thin films prepared at various gas pressures and gas flow rates by hot-wire chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2005.07.134 ◽

2006 ◽

Vol 501 (1-2) ◽

pp. 102-106 ◽

Cited By ~ 9

Author(s):

T. Daimaru ◽

A. Tabata ◽

T. Mizutani

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Gas Flow ◽

Chemical Vapor ◽

Hot Wire ◽

Microcrystalline Silicon ◽

Flow Rates ◽

Silicon Thin Films ◽

Gas Pressures

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